Issue 8, 2020

Validation of secondary fluorescence excitation in quantitative X-ray fluorescence analysis of thin alloy films

Abstract

X-ray fluorescence (XRF) analysis is a widely applied technique for the quantitative analysis of thin films up to the μm scale because of its non-destructive nature and because it is easily automated. When low uncertainties of the analytical results in the few percent range are required, the non-linear secondary fluorescence effect in multi-elemental samples may complicate an otherwise straightforward quantification, since it can easily exceed a relative contribution of 20%. The conventional solution, to rely on good performing reference samples, is hindered by their low availability, especially for thin film applications. To address this challenge, we demonstrate a flexible production method of multilayered, alloyed thin films with significant secondary fluorescence contributions. We use reference-free XRF analysis to validate the reliability of the physical model for secondary fluorescence, which includes a thorough uncertainty estimation. The investigated specimens are qualified as calibration samples for XRF or other quantitative analyses.

Graphical abstract: Validation of secondary fluorescence excitation in quantitative X-ray fluorescence analysis of thin alloy films

Article information

Article type
Paper
Submitted
17 Apr 2020
Accepted
07 Jul 2020
First published
07 Jul 2020

J. Anal. At. Spectrom., 2020,35, 1664-1670

Validation of secondary fluorescence excitation in quantitative X-ray fluorescence analysis of thin alloy films

A. Wählisch, C. Streeck, P. Hönicke and B. Beckhoff, J. Anal. At. Spectrom., 2020, 35, 1664 DOI: 10.1039/D0JA00171F

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