Abstract
We measure the reflectance spectra of 1.8 µm-thick FP9120 photoresist films doped with antimony ions and deposited by centrifugation on the surface of p-type silicon wafers (ρ = 10 Ω cm) with a (111) orientation. Implantation leads to a decrease in the refractive index of the photoresist due to the radiation crosslinking of Novolac resin molecules and a decrease in the molecular refraction and density of the photoresist. In the opacity region of the photoresist film, an increase in the reflection coefficient is observed with an increase in the implantation dose.
Similar content being viewed by others
REFERENCES
B. A. Lapshinov, Lithographic Process Technology. A Study Guide (MIEM, Moscow, 2011) [in Russian].
A. N. Gentselev, B. G. Gol’denberg, E. V. Petrova, V. F. Pindyurin, and A. S. Kozlov, J. Surf. Invest.: X‑ray, Synchrotron Neutron Tech. 6, 12 (2012). https://doi.org/10.1134/S1027451012010089.
V. P. Naz’mov, L. A. Mezentseva, V. F. Pindyurin, and V. E. Istomin, Poverkhn.: Rentgenovskie, Sinkhrotronnye Neitr. Issled., No. 3, 10 (2001) [in Russian].
A. V. Mitrofanov, O. V. Karban, A. Sugonyako, and M. Lubomska, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 3, 519 (2009). https://doi.org/10.1134/S1027451009040065.
S. A. Vabishchevich, D. I. Brinkevich, V. S. Volobuev, et al., Vestn. Polotsk. Gos. Univ., Ser. C: Fundam. Nauki, No. 9, 74 (2010) [in Russian].
D. I. Brinkevich, S. D. Brinkevich, and M. G. Lukashevich, Russ. Microelectron., 44 (6), 448 (2015). https://doi.org/10.1134/S1063739715060025.
S. A. Bulgakova, M. M. Jons, A. E. Pestov, et al., Russ. Microelectron. 42 (3), 165 (2013). https://doi.org/10.1134/S1063739713020054.
E. I. Rau, E. N. Evstaf’eva, S. I. Zaitsev, et al., Russ. Microelectron. 42 (2), 89 (2013). https://doi.org/10.1134/S1063739713020091.
Z. Yu. Gotra, Microelectronic Device Technology: A Reference Book (Radio i svyaz’, Moscow, 1991).
A. A. Harchenko, D. I. Brinkevich, S. D. Brinkevich, M. G. Lukashevich, and V. B. Odzhaev, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 9, 87 (2015). https://doi.org/10.1134/S1027451015010103.
Yu. A. Bumai, N. I. Dolgikh, A. A. Kharchenko, V. F. Valeev, V. I. Nuzhdin, R. I. Khaibullin, F. A. Nazhim, M. G. Lukashevich, and V. B. Odzhaev, Zh. Prikl. Spectrosk., No. 2, 192 (2014). https://doi.org/10.1007/s10812-014-9908-7.
Yu. A. Bumai, N. I. Dolgikh, I. A. Karpovich, et al., Mater., Tekhnol., Instrum., No. 4, 70 (2012) [in Russian].
Yu. A. Bumai, V. S. Volobuev, V. F. Valeev, et al., J. Appl. Spectrosc. 79 (5), 773 (2012). https://doi.org/10.1007/s10812-012-9669-0.
S. G. Yastrebov, T. Allen, V. I. Ivanov-Omskii, et al., Tech. Phys. Lett. 29 (10), 858 (2003) [in Russian].
Yu. A. Bumai, D. I. Brinkevich, V. S. Volobuev, N. I. Dolgikh, I. A. Karpovich, and M. G. Lukashevich, Vestn. Beloruss. Gos. Univ., Ser. 1: Fiz., Mat., Inf., No. 3, 41 (2012) [in Russian]. http://elib.bsu.by/handle/123456789/49214.
D. I. Brinkevich, A. A. Kharchenko, S. D. Brinkevich, et al., J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 11 (4), 801 (2017). https://doi.org/10.1134/S1027451017040188.
A. A. Harchenko, D. I. Brinkevich, S. D. Brinkevich, M. G. Lukashevich, and V. B. Odzhaev, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 9, 371 (2015). https://doi.org/10.1134/S1027451015020317.
A. A. Kharchenko, S. D. Shvarkov, E. A. Kolesnik, M. G. Lukashevich, Vestn. Belorus. Gos. Univ., Ser. 1, No. 2, 29 (2012) [in Russian]. http://elib.bsu.by/handle/123456789/44174.
A. A. Askadskii and V. I. Kondrashenko, Computational Material Science of Polymers. Vol. 1. Atom and Molecule Level (Nauchnyi mir, Moscow, 1999) [in Russian].
N. Grassie and G. Scott, Polymer Degradation and Stabilization (Cambridge University Press, Cambridge, 1985; Mir, Moscow, 1988) [in Russian].
Author information
Authors and Affiliations
Corresponding authors
Additional information
Translated by O. Zhukova
Rights and permissions
About this article
Cite this article
Kharchenko, A.A., Brinkevich, D.I., Prosolovich, V.S. et al. Radiation-Stimulated Transformation of the Reflectance Spectra of Diazoquinone–Novolac Photoresist Films Implanted with Antimony Ions. J. Surf. Investig. 14, 558–561 (2020). https://doi.org/10.1134/S1027451020030283
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1027451020030283