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Modified SAMs and templates for achieving self-alignment of full wafers

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Abstract

Self-assembly of structures that are more than a few millimeters in size is a current problem that can have broad applications in new ways to construct the objects that we use. As a step in that direction, fluidic self-alignment at the wafer-to-wafer level is demonstrated, characterized, and modeled. Although self-alignment of millimeter-sized objects has previously been shown, several physical processes become important as the structure size is increased to a whole wafer. These processes are measured and modeled in this paper. Self-assembled monolayers, both natural and modified by oxidation, are used to create surface energy gradients that are used to produce capillary alignment forces. These forces exceed the wafer-edge forces. The measured capillary fluid profile is modeled to predict the alignment forces with no adjustable parameters. Alignment forces are measured and the trends are predicted as the surface tension of the liquid, hence the generated force, is varied. These considerations govern pattern design rules, which are described and ensure a long capture range, high alignment force, and avoidance of wafer-edge dragging.

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Acknowledgements

This work was supported by AFRL-WPAFB (Grant FA8650-04-2-1619).

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Authors and Affiliations

  1. Physics Department, North Carolina State University, Raleigh, NC, 27695-8202, USA

    Ako Emanuel, Ernest M. Walker III & Hans D. Hallen

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  1. Ako Emanuel
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  2. Ernest M. Walker III
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  3. Hans D. Hallen
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Correspondence to Hans D. Hallen.

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Emanuel, A., Walker, E.M. & Hallen, H.D. Modified SAMs and templates for achieving self-alignment of full wafers. Microfluid Nanofluid 24, 49 (2020). https://doi.org/10.1007/s10404-020-02352-4

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