Low-Power Efficient p+ Si_0.7Ge_0.3 Pocket Junctionless SGTFET with Varying Operating Conditions

Abstract

A new low-power Si_1−xGe_x pocket junctionless single-gate tunnel field-effect transistor (JLSGTFET) is designed to achieve steep subthreshold performance and a better I_ON/I_OFF ratio (∼ 10⁸) in sub-20-nanometer technology node. The mole fraction of Ge represented by x is kept at 0.3 for the SiGe pocket region. The proposed JLSGTFET shows better performance with a Ge mole fraction value x = 0.3. The mole fraction value affects various electrical parameters in terms of leakage current, junction capacitance and transconductance of the channel region. The device exhibits reduced switching capacitance due to the smaller-bandgap pocket region between the source and channel. Analysis of the JLSGTFET is carried out for DC and AC parameters at room temperature. Temperature analysis plays a vital role in determining reliable ON- and OFF-state performance in transistors. Therefore, the proposed pocket JLSGTFET is investigated under harsh temperature conditions to characterize the performance for DC and subthreshold parameters. The sensitivity of the device is analyzed under different temperature conditions over a range of 250–400 K to observe subthreshold performance including transfer characteristics, output characteristics, I_ON/I_OFF ratio, subthreshold slope (SS) and drain-induced barrier lowering (DIBL). The JLSGTFET demonstrates a small variation in DC and subthreshold parameters, indicating good prospects for future analog and digital applications. All the analysis of the proposed JLSGTFET is carried out on a 2D/3D VisualTCAD device simulator.