Abstract
Fabrication of metal-organic frameworks (MOFs) thin films has been an efficient way to expand their functionalities and applications. Here, we use the vapor-assisted deposition (VAD) method to epitaxially grow a porphyrin-based MOF PCN-222 film. That is, vapor source assists to deposit pre-treated precursor solution on quartz substrate to form a continuous PCN-222 film. Furthermore, utilizing the post-treated encapsulation of functional carbon-based nanoparticles, the carbon nanodots (CND) and Pt doped CND (Pt/CND) are well loaded into the pores of PCN-222 film, the size (~3.1 nm) of which is highly close to the pore size of the corresponding MOF (~3.7 nm). The Z-scan results reveal that PCN-222 film exhibits high reverse saturable absorption. In addition, encapsulation of carbon based nanodots into PCN-222 film could enhance the nonlinear optical limiting effect benefiting from the host-guest combination. This study serves to present both the available toolbox of thin film preparation and high potential for precise synthetic nanocomposite films in optical limiting devices.
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Acknowledgements
This work was supported by the Strategic Priority Research Program of the Chinese Academy of Sciences (XDB20000000), the National Key Research and Development Program of China (2018YFA0208600), the National Natural Science Foundation of China (21872148, 21601189) and the Youth Innovation Promotion Association of Chinese Academy of Sciences (2018339).
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Xiao, YH., Gu, ZG. & Zhang, J. Vapor-assisted epitaxial growth of porphyrin-based MOF thin film for nonlinear optical limiting. Sci. China Chem. 63, 1059–1065 (2020). https://doi.org/10.1007/s11426-020-9759-6
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DOI: https://doi.org/10.1007/s11426-020-9759-6