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Erratum: Galvanic corrosion inhibitors for Cu/Ru couple during chemical mechanical polishing of Ru [ECS J. Solid-State Sci. Technol., 7, P62 (2017)]

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Published 11 May 2020 • © 2020 The Electrochemical Society ("ECS"). Published on behalf of ECS by IOP Publishing Limited
, , Citation Jie Cheng et al 2020 ECS J. Solid State Sci. Technol. 9 049002 DOI 10.1149/2162-8777/ab8f1a

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This is a correction for 2017 ECS J. Solid State Sci. Technol. 6 P62

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1 State Key Lab of Tribology, Tsinghua University, Beijing 100084, People's Republic of China

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  1. Received 30 April 2020
  2. Published

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In the published paper, Fig. 1b, on page P63, includes a word in Chinese characters. The corrected figure is shown below.

Figure 1.

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10.1149/2162-8777/ab8f1a