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Three Dimensional Maskless Ultraviolet Exposure System Based on Digital Light Processing

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Abstract

This paper reports the development of a three dimension maskless photolithography system with an oblique scanning method based on digital light processing technology. The system consists of a UV light source, a digital micromirror device (DMD), a microlens/pinhole array, two optical projection lenses, and a three-axis (xyz) servo-controlled stage. The optical system can form a rectangular array of UV spots with a diameter of few μm directly on the surface of a sample sitting on the stage. A photoresist (PR) layer is coated on the sample surface. Using an oblique scanning approach, the whole area of PR layer can be exposed by this UV exposure system in a maskless manner. Since the energy intensity of each UV spot can be independently modulated by a corresponding group of micromirrors in the DMD, and a three-dimensional (3D) UV dosage distribution can be achieved through computer programming on the DMD and the xyz stage. After developing processes, 3D PR microstructures with arbitrary patterns and/or surface profiles can be readily formed by this maskless lithography system. Experimental results will be addressed as well as potential applications for 2D and 3D microfabrication.

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Acknowledgements

This work is sponsored by the Ministry of Science and Technology of Taiwan under contracts of MOST 106-2221-E-006-135-MY2, MOST 106-3114-8-006-003, and MOST 107-2823-8-006-004.

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  1. Department of Mechanical Engineering, National Cheng Kung University, No.1, University Road, Tainan City, 701, Taiwan, ROC

    H. L. Chien & Y. C. Lee

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  1. H. L. Chien
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  2. Y. C. Lee
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Correspondence to Y. C. Lee.

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Chien, H.L., Lee, Y.C. Three Dimensional Maskless Ultraviolet Exposure System Based on Digital Light Processing. Int. J. Precis. Eng. Manuf. 21, 937–945 (2020). https://doi.org/10.1007/s12541-020-00318-8

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  • DOI: https://doi.org/10.1007/s12541-020-00318-8

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