Abstract
In this study, a GaN/LiNbO3 hybrid wafer was demonstrated using room-temperature bonding based on a surface activated bonding (SAB) method. The SAB using Fe-containing Ar ion beam bombardment achieved a strong bond between GaN and LiNbO3 wafers. The bonded wafer made using the modified SAB method was successfully cut into 1 × 1 mm2 dies using a dicing saw without interfacial debonding, and the measured tensile strength was estimated to be greater than approximately 26 MPa. These results show the presence of a strong bond that may be sufficient for device applications. In addition, TEM observation clearly indicated that the Fe-containing nanolayer deposited during ion beam bombardment appears to work well as an adhesive and form a strong bond between the negative surface of LiNbO3 and Ga-face of GaN. These results show the potential of this room-temperature bonding method to achieve a future GaN/LiNbO3 hybrid platform that can fully exploit the unique properties of each material.
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This was paper 974 presented at the Cancun, Mexico, Meeting of the Society, September 30–October 4, 2018.
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