Reactive ion etching of single crystal diamond by inductively coupled plasma: State of the art and catalog of recipes
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Highlights
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Review of the state of the art on reactive ion etching of single crystal diamond
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In-depth analysis of diamond ICP RIE process parameters
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Quantitative analysis of reported etch rates, selectivity and etch depths
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Comprehensive catalog of diamond ICP RIE recipes providing selection guidelines
© 2020 The Authors. Published by Elsevier B.V.