Reactive ion etching of single crystal diamond by inductively coupled plasma: State of the art and catalog of recipes

https://doi.org/10.1016/j.diamond.2020.107839Get rights and content
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Highlights

  • Review of the state of the art on reactive ion etching of single crystal diamond

  • In-depth analysis of diamond ICP RIE process parameters

  • Quantitative analysis of reported etch rates, selectivity and etch depths

  • Comprehensive catalog of diamond ICP RIE recipes providing selection guidelines

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