Issue 5, 2020
From the journal:

Nanoscale Advances

In situ fabrication of Al surface plasmon nanoparticles by metal–organic chemical vapor deposition for enhanced performance of AlGaN deep ultraviolet detectors

You Wu,ab   Xiaojuan Sun, ORCID logo *ab   Zhiming Shi,ab   Yuping Jia,ab   Ke Jiang,ab   Jianwei Ben,c   Cuihong Kai,ab   Yong Wang,ab   Wei Lü ORCID logo ad  and  Dabing Li ORCID logo *ab  

* Corresponding authors

a State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, People's Republic of China
E-mail: sunxj@ciomp.ac.cn, lidb@ciomp.ac.cn

b Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China

c College of Materials Science and Engineering, Shenzhen University, Shenzhen 518071, People's Republic of China

d Key Laboratory of Advanced Structural Materials, Ministry of Education, Changchun University of Technology, Changchun 130012, People's Republic of China

Abstract

Al nanoparticles (NPs) have been proven to be the efficient choice for plasmon enhanced AlGaN-based ultraviolet (UV) photodetectors. Previous studies have mainly been focused on the ex situ preparation of Al NPs, but the in situ growth of Al NPs is more desired. In this work, we predict the feasibility for in situ growth of Al surface plasmon NPs on AlGaN-based UV photodetectors by first-principles calculations, and realized it experimentally by metal–organic chemical vapor deposition. For metal–semiconductor–metal type AlGaN-based photodetectors with in situ grown Al surface plasmons, the peak of responsivity was at 288 nm, enhanced 9 times more than that without Al NPs at 10 V bias. The in situ growth method of Al NPs in the present work provides an efficient method for improving the performance of AlGaN-based UV photoelectric devices.

Graphical abstract: In situ fabrication of Al surface plasmon nanoparticles by metal–organic chemical vapor deposition for enhanced performance of AlGaN deep ultraviolet detectors

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Article information

DOI
https://doi.org/10.1039/D0NA00022A
Article type
Paper
Submitted
10 Jan 2020
Accepted
22 Feb 2020
First published
17 Mar 2020
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2020,2, 1854-1858

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In situ fabrication of Al surface plasmon nanoparticles by metal–organic chemical vapor deposition for enhanced performance of AlGaN deep ultraviolet detectors

Y. Wu, X. Sun, Z. Shi, Y. Jia, K. Jiang, J. Ben, C. Kai, Y. Wang, W. Lü and D. Li, Nanoscale Adv., 2020, 2, 1854 DOI: 10.1039/D0NA00022A

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