Elsevier

Microelectronic Engineering

Volume 112, December 2013, Pages 67-73
Microelectronic Engineering

Increased efficiency of direct nanoimprinting on planar and curved bulk titanium through surface modification

https://doi.org/10.1016/j.mee.2013.05.016Get rights and content
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Highlights

  • Direct nanopatterning of titanium using nanopatterned diamond based stamps.

  • Quantify nanopillar matrix imprint depth with regards to feature size and density.

  • An account of a novel method of reducing the imprint load required to emboss titanium.

  • TEM and EELS analysis following our load reduction treatment.

  • The first demonstration of nanopatterning curved, bulk titanium.

Abstract

In this work the direct transfer of nanopatterns into titanium is demonstrated. The nanofeatures are imprinted at room temperature using diamond stamps in a single step. We also show that the imprint properties of the titanium surface can be altered by anodisation yielding a significant reduction in the required imprint force for pattern transfer. The anodisation process is also utilised for curved titanium surfaces where a reduced imprint force is preferable to avoid sample deformation and damage. We finally demonstrate that our process can be applied directly to titanium rods.

Keywords

Nanoimprint
Implant
Metal
Stem-cell
Topography

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