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Domain Wall Precession in a Narrow Magnetic Nanowire Russ. Microelectron. Pub Date : 2021-02-19 O. S. Trushin, N. I. Barabanova
Abstract The dynamics of a transverse domain wall in a narrow magnetic permalloy nanowire in an external field is studied by the method of micromagnetic simulation. It was found that in the limit of a very small nanowire width (less than 40 nm), a precession of the domain wall is observed, accompanied by a change in its chirality. It is shown that the precession frequency increases with an increase
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Influence of Resist Spreading during Its Dry Electron-Beam Etching on a Lateral Resolution Russ. Microelectron. Pub Date : 2021-02-19 A. G. Isaev, F. A. Sidorov, A. E. Rogozhin
Abstract The influence of the spreading process of a resist on a decrease on a lateral resolution during its dry electron-beam etching is estimated. It is shown that the real line width cannot be explained by the scattering of electrons in the samples. Based on the profiles obtained using atomic force microscopy and scanning electron microscopy, it is demonstrated that the spreading process can significantly
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Modification of Diazoquinone-Novolac Photoresist Films by the Implantation of Antimony Ions Russ. Microelectron. Pub Date : 2021-02-19 S. D. Brinkevich, D. I. Brinkevich, V. S. Prosolovich
Abstract In this paper, we study the radiation-induced processes occurring during the implantation of antimony ions into films of the positive diazoquinone-novolac (DQN) FP9120 photoresist (PR) on silicon by the Fourier-transform infrared (FTIR) spectroscopy of the frustrated total internal reflection (TIR). Ion implantation (II) is found to lead to the appearance in the frustrated TIR spectrum of
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Kinetics of the Volumetric and Heterogeneous Processes in the Plasma of a C 4 F 8 + O 2 + Ar Mixture Russ. Microelectron. Pub Date : 2021-02-19 A. M. Efremov, D. B. Murin, A. M. Sobolev, K.-H. Kwon
Abstract In this paper, we investigate the relationship between the external and internal plasma parameters in a C4F8 + O2 + Ar mixture under conditions of an inductive radio-frequency (13.56 MHz) discharge. With the combined use of plasma diagnostics based on Langmuir probes and zero-dimensional (global) plasma simulation, first, the key plasma-chemical processes that form stationary electrophysical
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Experimental Study of the Influence of the Porosity of Thin-Film Silicon-Based Anodes on Their Charge-Discharge Characteristics Russ. Microelectron. Pub Date : 2021-02-19 T. L. Kulova, L. A. Mazaletskii, A. A. Mironenko, A. S. Rudyi, A. M. Skundin, Yu. S. Tortseva, I. S. Fedorov
Abstract The effect of porosity on the charge-discharge characteristics of thin films based on an Si–O–Al nanocomposite with two types of structure, homogeneous and columnar, is studied. An additional increase in the porosity of thin Si–O–Al films is achieved by removing the \({\text{Si}}{{{\text{O}}}_{x}}\) phase, where \(1 < x \leqslant 2,\) when etching in a solution of hydrofluoric acid. The charge-discharge
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Numerical Simulation of Cryogenic Etching: Model with Delayed Desorption Russ. Microelectron. Pub Date : 2021-02-19 M. K. Rudenko, A. V. Myakon’kikh, V. F. Lukichev
Abstract A numerical model of the evolution of the trench profile during cryogenic etching in SF6/O2 plasma based on the cellular representation of the surface state, the Monte Carlo method for calculating particle fluxes, and the scheme of delayed desorption of reaction products is proposed. This description combines the advantages of the cell method (the ability to describe phenomena of a stochastic
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Effect of Process-Related Impurities on the Electrophysical Parameters of a MOS Transistor Russ. Microelectron. Pub Date : 2021-02-19 V. B. Odzhaev, A. N. Petlitskii, V. S. Prosolovich, V. A. Filipenya, V. Yu. Yavid, Yu. N. Yankovskii
Abstract It is established that the electrophysical characteristics of MOS transistors largely depend on the quality of a gate dielectric. The presence of an extra built-in charge in the dielectric and fast surface states at the SiO2/Si interface leads to both an increased threshold voltage and decreased saturation current and voltage, decreased slopes of the characteristics of the MOS transistor in
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Metallization of Vias in Silicon Wafers to Produce Three-Dimensional Microstructures Russ. Microelectron. Pub Date : 2021-02-19 A. I. Vorobjova, V. A. Labunov, E. A. Outkina, D. V. Grapov
Abstract The processes of electrochemical deposition into a matrix of vertical vias of different diameters (500–2000 nm) in Si/SiO2 substrates with a TiN barrier layer at the bottom of the holes are studied. Morphological studies of the metal in the holes show that the structure of copper clusters is rather uniform and is formed from crystallites of ~30 to 50 nm. Repeatability and stability with a
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Effect of a Mixture’s Composition on the Electrophysical Parameters and Emission Spectra of Hydrogen Chloride Plasma with Chlorine and Helium Russ. Microelectron. Pub Date : 2021-02-19 S. A. Pivovarenok, D. B. Murin, D. V. Sitanov
Abstract The effect of a mixture’s composition on the electrophysical parameters and emission spectra of HCl/Cl2 and HCl/He plasmas under the conditions of a DC glow discharge is analyzed. The data on the gas temperature and reduced electric field strength are obtained. It is established that the reduced electric field strength in HCl/Cl2 plasma rises linearly with the rising fraction of the second
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Influence of Deposition Conditions and Ion-Plasma Treatment of Thin Cobalt Films on Their Electrical Resistivity Russ. Microelectron. Pub Date : 2021-02-19 I. I. Amirov, R. V. Selyukov, V. V. Naumov, E. S. Gorlachev
Abstract The electrical resistivity ρ of cobalt films with a thickness of 10 to 55 nm deposited in different modes of magnetron sputtering on SiO2/Si wafers with their subsequent ion-plasma treatment is investigated. Co films 42 nm thick with minimum ρ of 9.8 µΩ cm, comparable to ρ of a bulk metal, are obtained at a temperature of 600 K. Treating the Co film surface in dense argon plasma with an energy
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Issues of Implementing Neural Network Algorithms on Memristor Crossbars Russ. Microelectron. Pub Date : 2021-02-08 A. Yu. Morozov, K. K. Abgaryan, D. L. Reviznikov
Abstract The property of the natural parallelization of matrix-vector operations inherent in memristor crossbars creates opportunities for their effective use in neural network computing. Analog calculations are faster by orders of magnitude than calculations on a central processor and on graphics accelerators. Furthermore, the energy costs of mathematical operations are significantly lower. At the
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Factors Determining the Relevance of Creating a Research Infrastructure for Synthesizing New Materials in Implementing the Priorities of Scientific and Technological Development of Russia Russ. Microelectron. Pub Date : 2021-02-08 A. A. Zatsarinny, K. K. Abgaryan
Abstract In the modern world, knowledge and advanced technologies determine the effectiveness of the economy, and they can radically improve the quality of life of people, modernize infrastructure and public administration, and ensure law and order, as well as security. The creation of a research infrastructure based on a high-performance hybrid cluster, allows detailed calculations of complex phenomena
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Mathematical Modeling of Promising Structures of Metal Oxides Russ. Microelectron. Pub Date : 2021-02-08 P. A. Sechenykh
Abstract Information about the structure and properties of materials is especially important when working with micro-and nanoscale objects due to the complexity of obtaining it. This makes it relevant to use computer modeling to predict the required characteristics of materials. The electronic, magnetic, mechanical, and other properties of crystalline substances are determined by their structure: the
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Formation of an Individual Modeling Environment in a Hybrid High-Performance Computing System Russ. Microelectron. Pub Date : 2021-02-08 K. I. Volovich, S. A. Denisov, S. I. Malkovsky
Abstract In this paper, we consider the problem of solving scientific problems in the field of materials science in the environment of high-performance computing systems. Mathematical modeling methods implemented by specialized modeling systems is used to solve a certain kind of problems in materials science. The modeling systems show the greatest efficiency when deployed in hybrid high-performance
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Applying Numerical Simulation for the Investigation of Memristor Structures Based on Oxides and Chalcogenides Russ. Microelectron. Pub Date : 2021-02-08 V. V. Sirotkin, N. A. Tulina
Abstract— Models that describe bipolar resistive switching (BRS) in planar microstructures based on oxide compounds (Bi2Sr2CaCu2O8 + x and Nd2 – xCexCuO4 – y) and bismuth selenide are considered. Metal/insulator/metal planar-type memristor heterostructures in which the microsize is formed by an electrode with a diameter much smaller than the total size of the structure (which can be both Sharvin-type
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Nonlinear Dynamic Approach in Analyzing the Instability of Memristor Parameters Russ. Microelectron. Pub Date : 2021-02-08 I. V. Matyushkin
Abstract A general set of ideas related to the modeling of memristors is presented. The memristor is considered as a partially ordered physicochemical system, located in terms of nonlinear dynamics within the “edge of chaos.” The logical-historical relationship of the physics of memristors, nonlinear dynamics, and neuromorphic systems is illustrated in the form of a diagram. Nonlinearity is divided
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Multiangle Spectrophotometric Methods of Reflection for Determining Refractive Coefficients Russ. Microelectron. Pub Date : 2021-02-08 E. V. Zabelina, N. S. Kozlova, Zh. A. Goreeva, V. M. Kasimova
Abstract— The features of the development and application of the procedures for measuring refractive coefficients based on multiangle spectrophotometric methods of reflection are considered. The effect of the shape, size, and surface treatment of the samples on their spectral dependences of the reflection is described. The possibility of determining the refraction coefficients by two spectrophotometric
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The Main Scientific and Technical Problems of Using Hybrid HPC Clusters in Materials Science Russ. Microelectron. Pub Date : 2021-02-08 K. I. Volovich, S. A. Denisov
Abstract The article discusses the use of hybrid HPC clusters for the execution of software designed to calculate the electronic structure and atomic scale materials modeling. Modern software systems, which are designed to solve the problems of materials science, use the capabilities of various hardware computing accelerators to increase productivity. The use of such computing technologies requires
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The ALD Films of Al 2 O 3 , SiN x , and SiON as Passivation Coatings in AlGaN/GaN HEMT Russ. Microelectron. Pub Date : 2021-02-08 K. L. Enisherlova, E. M. Temper, Yu. V. Kolkovsky, B. K. Medvedev, S. A. Kapilin
Abstract In the field-effect transistors based on the wide-band-gap nitride heterostructures, the dielectric layers are in widespread use as one of the main elements in the active regions of the devices and the passivation layers. Stringent requirements are imposed on the dielectrics in terms of the high dielectric capacitance, large band-gap energy, and the coating integrity. Furthermore, the films
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Implementation of Memory in a System on a Chip with Built-In Self-Testing and Self-Healing Russ. Microelectron. Pub Date : 2021-01-27 V. G. Ryabtsev, S. V. Volobuev
Abstract When manufacturing systems on a chip using modern technologies with highly integrated elements, problems arise in testing and repairing the internal memory. The original architecture of the fault-tolerant semiconductor memory with the given failure detection rate is proposed. At the same time, rather than the entire device being backed up only the elements that are most susceptible to failures
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The Special Features of Simulation of the Current–Voltage Characteristics of JFETs in the Cryogenic Temperature Range Russ. Microelectron. Pub Date : 2021-01-27 K. O. Petrosyants, M. R. Ismail-Zade, L. M. Sambursky
Abstract The compact models of junction field effect transistors (JFETs) used in release-quality versions of SPICE-like programs are focused only on the standard temperatures ranging from –60 to 150°C and are unworkable for an electronic circuit design in the cryogenic temperature range (below –120°C). It this study, the Low-T SPICE model of the JFET for designing electronic circuits in the extended
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Thermal Stabilization of the Geometric Parameters of an Array of Silver Nanoparticles Obtained by Vacuum-Thermal Evaporation on an Unheated Substrate Russ. Microelectron. Pub Date : 2021-01-27 D. G. Gromov, S. V. Dubkov, G. S. Eritsyan, A. I. Savitsky, V. A. Bykov, Yu. A. Bobrov
Abstract The nanoscale state for many substances differs significantly from the massive state. During the formation of arrays of silver nanoparticles by condensation on a cold substrate, the initial condensate is unstable. For the formation of stable arrays with a shape close to spherical, subsequent weak heat treatment is required. In this work the behavior of an array of silver nanoparticles during
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Investigation of the Effects of Random Vibration on the Characteristics of Micromechanical Accelerometers Russ. Microelectron. Pub Date : 2021-01-27 Aung Thura, B. M. Simonov, S. P. Tymoshenkov
Abstract For modern information, measuring, and optoelectronic systems based on micro- and nanomechanical sensors of angular velocity and linear acceleration, it is important to ensure their stable functioning in the presence of external factors. The paper presents the results of a study of the effect of a random vibration on the characteristics of micromechanical accelerometers (MMAs) obtained using
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Thermomechanical Strength of Element Connections in Microelectronic Modules Russ. Microelectron. Pub Date : 2021-01-27 A. I. Pogalov, A. Yu. Titov, S. P. Timoshenkov
Abstract The design and technology of solder and adhesive bonds, as well as the elastic strength and plastic properties of the materials of a Si crystal, solder, and glue joint, are the most significant factors characterizing the reliability and durability of a microelectronic module. The structure proposed in this paper is designed to reduce its weight and size characteristics, improve reliability
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Biosensor Based on Ion-Sensitive Nanowire Field-Effect Transistor Using the Minimum Contact to the Floating Gate Russ. Microelectron. Pub Date : 2021-01-27 O. V. Gubanova, E. V. Kuznetsov, E. N. Rybachek, A. N. Saurov
Abstract The ion-sensitive field effect transistor (ISFET) is a promising tool for detecting intermolecular interactions, including biochemical ones. Using the ISFET, it is possible to recognize various mechanisms of specifically adsorbed substances. In addition, ISFET can be integrated with CMOS technology, which opens up new prospects for creating intelligent micro- and nanosystems. In this study
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Study of SOI Field-Effect Hall Sensors in the Partial Depletion Mode Russ. Microelectron. Pub Date : 2021-01-27 M. A. Korolev, V. N. Mordkovich, A. V. Leonov, S. S. Devlikanova
Abstract Earlier, when studying with the help of instrument-technological simulation of the silicon-on-insulator field-effect Hall sensor (SOI FEHS) in the partial depletion mode, the effect of increasing its magnetic sensitivity was discovered. In this paper, we study the parameters of SOI-FEHS samples in various operation modes to experimentally confirm the discovered effect. To increase the measurement
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Spectrophotometric Monitoring of Chloride Electrolyte for the Electrochemical Deposition of Permalloy Russ. Microelectron. Pub Date : 2021-01-27 R. D. Tikhonov, S. A. Polomoshnov, D. V. Kostuk
Abstract The use of chloride electrolytes for the electrochemical deposition of the Ni81Fe19 permalloy is promising because sulfate electrolytes are unstable in the presence of sulfur. The magnetic properties of the Ni81Fe19 alloy are very sensitive to the deviation of the composition from the molar ratio of 4.26 between components. In this study, the accuracy of preparing the chloride electrolyte
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Determining the Junction-to-Case Thermal Resistance of a Semiconductor Device from Its Cooling Curve Russ. Microelectron. Pub Date : 2021-01-27 N. L. Evdokimova, V. V. Dolgov, K. A. Ivanov
Abstract The thermal resistance of a semiconductor device determines the limiting thermal regime that guarantees its operability: the higher the thermal resistance of a semiconductor device the larger its overheating can be. Therefore, the thermal resistances of commercial devices must be controlled. At present, the method for determining the junction-to-case thermal resistance using the structure
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Active Processor Hardware Stack Russ. Microelectron. Pub Date : 2021-01-27 A. A. Semenov, D. A. Usanov, A. S. Dronkin
Abstract The characteristic features of the reduced instruction set computer (RISC) architecture are used to develop high-performance microprocessors and microcontrollers. Complex operations, which include subroutine calls and interrupt service, are difficult to implement in hardware for the same time interval with all the other commands. Such operations, when executed, involve recording the value
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Determination of the Operating Time to Failure of a Sub-100-nm MOS Transistor Gate Dielectric Using Accelerated Tests Russ. Microelectron. Pub Date : 2021-01-27 A. S. Sivchenko, E. V. Kuznetsov, A. N. Saurov
Abstract A gate dielectric is one of the key structural elements of submicron MOS transistors, on which the reliability of its operation depends. A breakdown of the dielectric leads to a loss in the functioning of the transistor and the failure of the entire IC or a malfunction in its operation. Therefore, special attention is paid to assess the defectiveness of a gate dielectric and its operating
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Thermal Activation of Getters in Magnetron Production Technology Russ. Microelectron. Pub Date : 2021-01-27 A. A. Polunina, V. S. Petrov, I. F. Khanbekov, I. P. Li, A. I. Gaidar, D. N. Loktev
Abstract In order to develop a scientifically grounded technology for production of porous getters, there appears the necessity to apply highly sensitive methods for determining the activation temperature, which are compatible with the standard magnetron pumping technology. In this study, a complex technique for determining the activation temperature for porous getters is proposed using the experimental
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Charge Properties of the MOS Transistor Structure with the Channel Made from a Two-Dimensional Crystal Russ. Microelectron. Pub Date : 2021-01-27 T. I. Makovskaya, A. L. Danilyuk, A. V. Krivosheeva, V. L. Shaposhnikov, V. E. Borisenko
Abstract Two-dimensional (2D) semiconductor crystals can be applied to further increase the efficiency and speed of field-effect transistors. Such transistors are free from some of the adverse effects present in the traditional MOS transistors when their size is reduced. In this study, the model of the transistor MOS structure with the channel made of a 2D-crystal is proposed and its charge properties
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Amorphization of Vanadium Oxides during the Reversible Insertion of Lithium Russ. Microelectron. Pub Date : 2021-01-27 A. M. Skundin, A. A. Mironenko, A. S. Rudyi, I. S. Fedorov, S. V. Vasiliev, L. A. Mazaletsky, Yu. S. Tortseva, O. E. Kuznetsov
Abstract The results of studying the structure and phase composition of thin-film positive electrodes of a lithium-ion battery based on vanadium oxides are presented. It is shown that initially polycrystalline films contain higher V2O5 and V3O7 oxides, the proportion of which increases with the time of oxygen annealing. As a result of charge–discharge cycling, the higher vanadium oxides are amorphized
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Technology of Nanosized Metal Layers for Forming a Reliable Contact to the Drain Area of Silicon Transistors Russ. Microelectron. Pub Date : 2021-01-27 T. A. Ismailov, A. R. Shakhmaeva, B. A. Shangereeva
Abstract The technology of mounting a crystal of a semiconductor device is described. The technology of soldering in mounting a crystal of a semiconductor device is presented. The question of using lead solders for soldering silicon crystals is considered. Methods for the formation of multilayer metallization of the reverse side of the crystal are considered and the optimal technology is selected.
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Modeling of the Crystallization and Correlation of the Properties with the Composition and Particle Size in Two-Dimensional GaS x Se 1 – x (0 ≤ х ≤ 1) Russ. Microelectron. Pub Date : 2021-01-27 S. M. Asadov, S. N. Mustafaeva, V. F. Lukichev
Abstract The paper presents the results of modeling, theoretical and experimental investigations on the physicochemical conditions of the synthesis, calculation of the Т–х phase diagram, thermodynamics and kinetics of crystallization, and correlation of the properties with the composition and grain sizes of semiconducting solid solutions in the two-dimensional (2D) GaS–GaSe system, in which the complete
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Effect of Point Defects on the Electromigration Rate at the Interface of Joined Materials Russ. Microelectron. Pub Date : 2021-01-27 T. M. Makhviladze, M. E. Sarychev
Abstract In this paper, we develop the theoretical concepts that allow establishing a relationship between the HEM activation energy of the electromigration of the intrinsic ions of a conductive material along the boundary of its compound (interface) with another (dielectric) material and the work Wa of the reversible separation of materials along this interface. The relationship between the energy
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Thermal Atomic Layer Deposition of TiN x Using TiCl 4 and N 2 H 4 Russ. Microelectron. Pub Date : 2021-01-27 A. I. Abdulagatov, M. Kh. Rabadanov, I. M. Abdulagatov
Abstract Atomic layer deposition (ALD) of titanium nitride (TiN) is carried out by the alternate surface reactions of titanium tetrachloride (TiCl4) and hydrazine (N2H4) at temperatures ranging from 150 to 350°C. The film deposition process is monitored in situ by quartz piezoelectric microweighing (QPM) and Fourier transform infrared spectroscopy (FTIRS). The QPM data detects the self-limiting character
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Spots Concept for Problems of Artificial Intelligence and Algorithms of Neuromorphic Systems Russ. Microelectron. Pub Date : 2021-01-27 N. A. Simonov
Abstract The paper presents the concept and basis for the apparatus of a new mathematical object—spots, which follows the concept of “mental images” in psychology and corresponds to the idea of vague geometric objects. Since mental images are semantic ones, spots appear to be an adequate mathematical object, promising for solving problems of artificial intelligence (AI), including the knowledge representation
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Kinetics and Mechanisms of Reactive-Ion Etching of Si and SiO 2 in a Plasma of a Mixture of HBr + O 2 Russ. Microelectron. Pub Date : 2021-01-27 A. M. Efremov, V. B. Betelin, K.-H. Kwon
Abstract In this paper, we investigate the kinetics and mechanisms of reactive-ion etching of Si and SiO2 in the plasma of an HBr + O2 mixture with a variable initial composition under conditions of the high-frequency (13.56 MHz) inductive discharge. In the experimental and theoretical (model) analysis of the plasma parameters, the key plasma-chemical processes that form the stationary composition
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Simulation of Resistive Switching in Memristor Structures Based on Transition Metal Oxides Russ. Microelectron. Pub Date : 2020-09-24 O. O. Permyakova, A. E. Rogozhin
Abstract The main approaches to the simulation of resistive switching in systems with transition metal oxide layers are discussed. The algorithms and results of ab initio simulation of such systems, in particular, the energy barrier heights for generation, recombination, and migration of defects in the HfOx and Ta2O5 films, are briefly described. The approaches to the finite element and Monte Carlo
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Study of the Relaxational Polarization Dynamics of the LiPON Solid Electrolyte Russ. Microelectron. Pub Date : 2020-09-24 A. S. Rudyi, M. E. Lebedev, A. A. Mironenko, L. A. Mazaletskii, V. V. Naumov, A. V. Novozhilova, I. S. Fedorov, A. B. Churilov
Abstract The results of investigation of the polarization relaxation mechanism for the LiPON solid electrolyte by a discharge through an external load are presented. Test cells implemented in the form of encapsulated multilayer structures \({{{{{{\text{Si}{{\text{O}}_{\text{2}}}}/{\text{Pt}}(100\,\,\text{nm})}/{\text{LiPON}\,(1000\,\,\text{nm})}}/{\text{Pt}~(100\,\,\text{nm})}}/{\text{Ti}~(10\,\,\
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Modeling the Characteristics of SOI CMOS Nanotransistors with an Asymmetric Surrounding Gate Russ. Microelectron. Pub Date : 2020-09-24 N. V. Masal’skii
Abstract An approach to an end-to-end simulation of the electrophysical characteristics of lowly doped sub-25-nm SOI (silicon-on-insulator) CMOS transistors with an asymmetric surrounding gate composed of two sequentially connected materials with different work functions is considered. The approach consists of the consecutive calculation of the 3D potential distribution in the working region, calculation
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Charge Transport Mechanism in a Formless Memristor Based on Silicon Nitride Russ. Microelectron. Pub Date : 2020-09-24 O. M. Orlov, A. A. Gismatulin, V. A. Gritsenko, D. S. Mizginov
Abstract Silicon oxide and silicon nitride are two key dielectrics in silicon devices. The advantage of silicon nitride over other dielectrics is that silicon nitride is compatible with silicon technology. Despite numerous studies, the mechanism of charge transfer in the storage elements of resistive memory based on silicon nitride is still not clear. It is required to study in detail the mechanism
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Ab Initio Modeling of the Electronic and Energy Structure and Opening the Band Gap of a 4 p -Element-Doped Graphene Monolayer Russ. Microelectron. Pub Date : 2020-09-24 M. M. Asadov, S. S. Guseinova, V. F. Lukichev
Abstract In this paper, we study the electronic and band structure of 4p-elements (M = Ge, Si)-doped graphene nanosheets with vacancies by the density functional theory method. The adsorption energy of the doping atoms and the relative stability of doped graphene monolayers are estimated. An antiferromagnetic ordering is discovered in these graphene-based systems. Based on the analysis of the electronic
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Simulation of Transients in a Majority Gate upon Switching and Collecting Charge from the Track of a Single Particle Russ. Microelectron. Pub Date : 2020-09-24 V. Ya. Stenin, Yu. V. Katunin
Abstract The results of the simulation of a triple majority element during the charge collection from a particle track by transistors and simultaneous input switching are reported. The simulation is made using the 3D TCAD physical models of CMOS transistors according to the bulk 65-nm design rule for tracks with a linear energy transfer of 60 MeV cm2/mg to them by a particle. It is found that the duration
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Study of the Magneto-Optical Properties of Structures on Curved Surfaces for Creating Memory Elements on Magnetic Vortices Russ. Microelectron. Pub Date : 2020-09-24 A. V. Prokaznikov, V. A. Paporkov
Abstract The regularities of the magneto-optical (MO) response of the metallized surface of nanostructured lead selenide are studied. The MO hysteresis loops (MOHLs) of the equatorial Kerr effect (MOEKE) exhibit the characteristic features inherent to the presence of vortex magnetic structures in the system. The regularities of the evolution of the shape of the hysteresis loops of the MOEKE depending
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Determination of Thermoelectric Cooling Modes of Heat-Loaded Electronics Russ. Microelectron. Pub Date : 2020-07-16 E. N. Vasil’ev
AbstractA computational algorithm is presented for determining the modes of thermoelectric cooling that ensure the given temperature difference of the base of the heat-loaded element and the environment. The obtained analytical expressions make it possible to determine the power supply current of the thermoelectric module taking into account its operating characteristics, thermal resistance of the
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Single-Photon Response and Microdisk Spectroscopy in a Diamond Substrate Russ. Microelectron. Pub Date : 2020-07-16 M. S. Rogachev; I. Yu. Kateev; A. V. Tsukanov
AbstractThe spectral characteristics of a microdisk in a diamond substrate with metal gates are simulated. It is shown that the radiative quality factor of a microdisk depends on the parameters of the substrate and the gates. Q-factor oscillations are detected with increasing distance between the disk and the substrate. The spectroscopic response of a microdisk with an NV center is obtained, and the
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Calculation of the Electrical Conductivity of a Thin Cylindrical Conducting Tube Taking into Account the Anisotropy of the Isoenergetic Surface Russ. Microelectron. Pub Date : 2020-07-16 I. A. Kuznetsova; D. N. Romanov
AbstractIn the kinetic approach, the electrical conductivity of a thin conducting tube is calculated using diffuse boundary conditions for the distribution function. The case of an anisotropic isoenergetic surface of a conductor having the form of a triaxial ellipsoid, one of the axes of which is parallel to the axis of the tube, is considered. The dependences of the modulus and the conductivity argument
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High-Voltage LDMOS Transistors on an SOI Structure for Electronics That Operate in Extreme Conditions Russ. Microelectron. Pub Date : 2020-07-16 S. I. Babkin; S. I. Volkov; A. A. Glushko; S. A. Morozov; A. S. Novoselov; A. A. Stolyarov
AbstractThe parameters of high-voltage LDMOS transistors on a silicon structure on an insulator formed in a technological cycle combined with the manufacturing technology of low-voltage CMOS LSI are investigated. LDMOS transistors are studied under conditions of the temperature changing in the range –60 to 300°C and exposure to ionizing radiation.
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Physical Parameters of the Broadband Noise-Generator Diodes Russ. Microelectron. Pub Date : 2020-07-16 V. V. Buslyuk; V. B. Odzhayev; A. K. Panfilenko; A. N. Petlitsky; V. S. Prosolovich; V. A. Filipyenya; Yu. N. Yankovsky
AbstractThe physical parameters of the silicon noise-generator diodes manufactured on single-crystalline silicon substrates by planar technology are studied by the method of the measurement of the current–voltage characteristics (I–V curves) and capacity–voltage characteristics (C–V curves). It is found that the value of the reverse current in the generator diodes is determined by ionization of the
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Modifying the Dielectric Properties of the TlGaS 2 Single Crystal by Electron Irradiation Russ. Microelectron. Pub Date : 2020-07-16 S. M. Asadov; S. N. Mustafaeva; V. F. Lukichev
AbstractThe dielectric properties and ac conductivity of an electronically irradiated layered TlGaS2 single crystal are studied in the frequency range of 5 × 104–3.5 × 107 Hz. It is established that electron irradiation of TlGaS2 single crystal samples with doses of 2 × 10l2 to 2.4 × 1013 e/cm2 leads to a decrease in the real component (ε') of the complex dielectric permittivity in a high-frequency
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Calculation of Performance of MEMS-Switch with Increased Capacitance Ratio Russ. Microelectron. Pub Date : 2020-07-16 I. V. Uvarov; N. V. Marukhin; P. S. Shlepakov; V. F. Lukichev
AbstractA capacitive type MEMS switch with electrostatic control is presented. A movable electrode is made in the form of a beam fixed at both ends. A metal electrode with a floating potential which allows increasing the ratio of the capacities in the on and off states by more than an order of magnitude compared to the classical design is considered a feature of the device. The operating characteristics
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Plasma Parameters and Kinetics of Active Particles in the Mixture CHF 3 + O 2 + Ar Russ. Microelectron. Pub Date : 2020-07-16 A. M. Efremov; D. B. Murin; K.-H. Kwon
AbstractThe effect of the O2/Ar component ratio in the CHF3 + O2 + Ar mixture on the electrical parameters of the plasma, kinetics of active particles, and their stationary concentrations under the high-frequency (13.56 MHz) induction discharge is investigated. Using jointly the plasma diagnostics and simulation techniques, (i) features of the plasma composition in the oxygen-free system CHF3 + Ar
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Influence of Oxygen Pressure on Switching in Memoristors Based on Electromoformed Open Sandwich Structures Russ. Microelectron. Pub Date : 2020-07-16 V. M. Mordvintsev; E. S. Gorlachev; S. E. Kudryavtsev; V. L. Levin
AbstractSamples of nonvolatile electrically reprogrammable memory elements (memristors) based on electroformed TiN–TiO2–SiO2–W open sandwich structures, made using thin-film technology, are studied. A technique is developed and experimental studies are performed of the effect of oxygen pressure over the surface of the insulating gap of structures and the current limiting mode during the action of a
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Planar Triode for Vacuum Microelectronics Russ. Microelectron. Pub Date : 2020-05-18 S. Sh. Rekhviashvili; D. S. Gaev
AbstractThe article studies a triode for vacuum microelectronics with horizontal geometry (planar triode). A simple theoretical model of the device is proposed and the minimum cutoff voltage is calculated. Experiments are carried out on the fundamental model of the device, which qualitatively confirm the main theoretical conclusions.
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The Effect of Temperature on the Development of a Contrast HSQ Electronic Resist Russ. Microelectron. Pub Date : 2020-05-18 A. A. Tatarintsev; A. V. Shishlyannikov; K. V. Rudenko; A. E. Rogozhin; A. E. Ieshkin
AbstractA study was made of the dependence of the contrast value of a negative electron resist based on hydrogen-silsesquioxane (HSQ) in the process of the development of NaOH–NaCl in an aqueous alkaline-salt solution at various temperatures. When the temperature of the developer rises from 22 to 40°C the contrast increases by 45%. An increase in contrast was also found with a decrease in the developing
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Concerning the Effect of Type of Fluorocarbon Gas on the Output Characteristics of the Reactive-Ion Etching Process Russ. Microelectron. Pub Date : 2020-05-18 A. M. Efremov; D. B. Murin; K.-H. Kwon
AbstractThe comparative research of the parameters, steady-state composition, and the effects of heterogeneous interaction in the plasma of fluorocarbon gases CxHyFz with various z/x relations in conditions of an induction RF (13.56 MHz) discharge is carried out. The binary systems CxHyFz + Ar based on CF4 (z/x = 4), CHF3 (z/x = 3), and C4F8 (z/x = 2) are used as the subjects of research. Through the
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Modeling of Single Ionizing Particle Impacts on Logical Elements of a CMOS Triple Majority Gate Russ. Microelectron. Pub Date : 2020-05-18 Yu. V. Katunin; V. Ya. Stenin
AbstractThe results of the TCAD (Technology Computer Aided Design) simulation of 65-nm bulk CMOS combinational logical elements of a triple majority gate (TMG) for a reliable microprocessor redundant system are presented. The AND and the OR logic elements, each of which consists of NAND and NOR elements and pairs of inverters, topologically located before and after the line of transistors of each of
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Nonlocal Electron Dynamics in Donor‒Acceptor Doped Transistor Heterostructures Russ. Microelectron. Pub Date : 2020-05-18 A. B. Pashkovskii; A. S. Bogdanov; V. M. Lukashin; S. I. Novikov
AbstractA simple phenomenological model for estimating a drift velocity peak in transistor heterostructures with the strong electron localization in the channel is developed using a self-consistent solution of the Schrödinger and Poisson equations and a system of hydrodynamic equations. It is shown that, when an electron enters the region of a strong field, the donor–acceptor doping increases the average
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