The electrodeposition of copper in the presence of a magnetic field has previously been shown to affect both electrochemical processes and the microstructure. In this work, we report a magnetically-induced anomalous second phase in thick films deposited with a current density of 500 mA/cm² and 0.5 T magnetic field strength. Atom probe tomography suggests the phase is a combination of CuH and CuH₂. Formation of the latter phases is likely induced by the applied magnetic field and indicates its role in promoting the hydrogen evolution reaction during deposition.

中文翻译：

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磁场辅助电沉积铜过程中氢化铜异相的研究

先前已经证明在磁场存在下电沉积铜会影响电化学过程和微观结构。在这项工作中，我们报告了在电流密度为500 mA / cm ²且磁场强度为0.5 T的情况下沉积的厚膜中的磁感应异常第二相。原子探针层析成像表明该相是CuH和CuH ₂的组合。后一相的形成可能是由施加的磁场引起的，并表明了其在沉积过程中促进氢释放反应的作用。