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Electrochemical and in situ SERS study of the role of an inhibiting additive in selective electrodeposition of copper in sulfuric acid
Electrochemistry Communications ( IF 5.4 ) Pub Date : 2018-11-15 , DOI: 10.1016/j.elecom.2018.11.007
Toshio Haba , Katsuyoshi Ikeda , Kohei Uosaki

The role of an inhibiting additive in selective copper (Cu) deposition was investigated using linear sweep and cyclic voltammetry and in situ SERS. Both the normalized SERS peak intensity of Basic Red 12 and the Cu deposition current showed hysteresis. These results indicate that Basic Red 12 desorbs or decomposes on the surface during electrodeposition of Cu. Therefore the concentration of Basic Red 12 on the patterned area decreases more than that on the flat area. This inhomogeneity of concentration leads to the preferential growth of Cu on the patterned area.



中文翻译:

电化学和原位SERS研究抑制剂在硫酸中铜选择性电沉积中的作用

使用线性扫描和循环伏安法以及原位SERS研究了抑制剂在选择性铜(Cu)沉积中的作用。碱性红12的归一化SERS峰强度和Cu沉积电流均显示出磁滞现象。这些结果表明,碱性红12在电沉积Cu的过程中会在表面脱附或分解。因此,在图案区域上的碱性红色12的浓度比在平坦区域上的浓度减少的更多。浓度的这种不均匀性导致图案区域上Cu的优先生长。

更新日期:2018-11-15
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