The field of plasmonics seeks to find materials with an intensive plasmon (large plasmon pole weight) with low Landau, phonon, and other losses (small decay width). In this paper, we propose a new class of materials that show exceptionally good plasmonic properties. These materials consist of van der Waals stacked “plasmon active” layers (atomically thin metallic layers) and “supporting” layers (atomically thin wide band gap insulating layers). One such material that can be experimentally realized—lithium intercalated hexagonal boron-nitride is studied in detail. We show that its 2D plasmon intensity is superior to the intensity of well-studied Dirac plasmon in heavy doped graphene, which is hard to achieve. We also propose a method for computationally very cheap, but accurate analysis of plasmon spectra in such materials, based on one band tight-binding approach and effective background dielectric function.

等离激元学领域寻求找到具有高等离激元（大等离激元极重）且具有低Landau，声子和其他损耗（小衰减宽度）的材料。在本文中，我们提出了一类新型的材料，这些材料显示出非常好的等离子体性能。这些材料由范德华堆叠的“等离激元活性”层（原子上薄的金属层）和“支撑”层（原子上薄的宽带隙绝缘层）组成。详细研究了一种可以通过实验实现的材料-锂嵌入六方氮化硼。我们表明，其2D等离子体激元的强度优于重掺杂石墨烯中经过深入研究的Dirac等离子体激元的强度，这很难实现。我们还提出了一种计算非常便宜但精确分析此类材料中的等离激元光谱的方法，