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Adsorption of halogens on metal surfaces
Surface Science Reports ( IF 9.8 ) Pub Date : 2018-06-02 , DOI: 10.1016/j.surfrep.2018.03.001
B.V. Andryushechkin , T.V. Pavlova , K.N. Eltsov

This paper presents a review of the experimental and theoretical investigations of halogen interaction with metal surfaces. The emphasis was placed on the recent measurements performed with a scanning tunneling microscope in combination with density functional theory calculations. The surface structures formed on metal surface after halogen interaction are classified into three groups: chemisorbed monolayer, surface halide, bulk-like halide. Formation of monolayer structures is described in terms of surface phase transitions. Surface halide phases are considered to be intermediates between chemisorbed halogen and bulk halide. The modern theoretical approaches in studying the dynamics of metal halogenation reactions are also presented.



中文翻译:

卤素在金属表面的吸附

本文介绍了卤素与金属表面相互作用的实验和理论研究。重点放在结合密度泛函理论计算的扫描隧道显微镜最近的测量上。卤素相互作用后在金属表面形成的表面结构可分为三类:化学吸附单层,表面卤化物,块状卤化物。根据表面相变描述了单层结构的形成。表面卤化物相被认为是化学吸附的卤素和本体卤化物之间的中间产物。还提出了研究金属卤化反应动力学的现代理论方法。

更新日期:2018-06-02
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