Abstract Studies in surface science have yielded many perspectives and techniques to solve the two biggest issues in the synthesis of two dimensional materials: degradation during transfer and restriction of applying functional substrates. Atomic manipulation of the surface environment is considered as an essential factor to solve these issues. For example, for the synthesis of graphene, an extremely clean surface can modify the substrate catalytic activity, assist uniform nucleation and avoid structural defects, which can improve the quality of graphene. In addition, many surface treatment techniques have shown great potential for achieving smooth and clean surfaces via physical and chemical etching methods while providing sufficient energy for precursors to decompose, which could potentially avoid the transfer process and enable the use of dielectric substrates at low temperatures. In all, an extremely clean surface is key to the success of direct synthesis of high quality 2D materials on functional substrates in different shapes.

中文翻译：

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在极其干净的表面上合成二维材料

摘要 表面科学的研究已经产生了许多观点和技术来解决二维材料合成中的两个最大问题：转移过程中的降解和应用功能基材的限制。表面环境的原子操作被认为是解决这些问题的重要因素。例如，对于石墨烯的合成，极其干净的表面可以改变底物催化活性，有助于均匀成核并避免结构缺陷，从而可以提高石墨烯的质量。此外，许多表面处理技术已经显示出通过物理和化学蚀刻方法获得光滑清洁表面的巨大潜力，同时为前体分解提供足够的能量，这可能会避免转移过程，并能够在低温下使用介电基板。总之，极其干净的表面是在不同形状的功能基板上直接合成高质量 2D 材料成功的关键。