High Temperature Ovens (HTOs) have widely been used to evaporate refractory materials in electron cyclotron resonance ion sources to produce hundreds of microamperes of multiply and highly charged metal ion beams. To meet the demands of milliamperes of multiply charged uranium and other heavy metal ion beams for future accelerators, a new and low-cost HTO is under development at Lawrence Berkeley National Laboratory for better long-term stability at high evaporation rates. ANSYS simulations have been carried out to optimize the new HTO with low heating current to reduce the electromagnetic forces as an HTO is immersed in the strong ECRIS magnetic fields. A larger loading volume is employed to deal with higher material consumption. Off-line tests have shown that the unloaded new HTO operates stably up to 1800-1900 °C with low temperature gradients and good repeatability. This paper presents and discusses the conceptual design features of the new HTO and off-line tests.

中文翻译：

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开发用于使用 ECR 离子源产生强金属离子束的新型高温炉

高温炉 (HTO) 已广泛用于蒸发电子回旋共振离子源中的耐火材料，以产生数百微安的多电荷和高电荷金属离子束。为了满足未来加速器对毫安多电荷铀和其他重金属离子束的需求，劳伦斯伯克利国家实验室正在开发一种新型低成本 HTO，以在高蒸发率下具有更好的长期稳定性。已执行 ANSYS 仿真以优化具有低加热电流的新型 HTO，以减少 HTO 浸入强 ECRIS 磁场时的电磁力。采用更大的装载量来处理更高的材料消耗。离线测试表明，卸载后的新型 HTO 可在高达 1800-1900 °C 的温度下稳定运行，具有较低的温度梯度和良好的重复性。本文介绍并讨论了新 HTO 和离线测试的概念设计特点。