Abstract Plasmonic color generation is a promising field of study that have the potential to produce paradigm-shifts in display and printing technologies. To produce vibrant colors, plasmonic surfaces decorated with complex corrugated or protruding structures have been the commonly adopted strategy for saturated structural color generation. However, it is particularly challenging to cover the full sRGB color gamut due to difficulty in achieving narrowband spectral response via plasmonic structures. Here we report a flat silver film decorated with 90 nm-thick resist nanostructures of low aspect-ratio feature (0.25–0.55). With such a facile and close-to-uniform morphology, we experimentally demonstrate sub-20-nm linewidth of full-width-half-maxima (FWHM) of reflection spectra in the visible range, realizing a color gamut comparable to that of ultra-high definition TV (UHDTV) in the chromaticity diagram. Our work breaks the conventional notion that sophisticated and high aspect-ratio plasmonic and dielectric nanostructures are indispensable, and highly saturated color are impossible for plasmonic nanoprinting. The unique structure enables an etch-free fabrication and recycling recipe, with the potential for mass production by nanoimprinting lithography and other applications including multicolor holographic projection.

中文翻译：

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平面银上的图案化抗蚀剂可实现具有亚 20 纳米光谱线宽的饱和等离子体颜色

摘要 等离子颜色生成是一个很有前途的研究领域，有可能在显示和印刷技术中产生范式转变。为了产生鲜艳的色彩，装饰有复杂波纹或突出结构的等离子体表面已成为饱和结构颜色生成的常用策略。然而，由于难以通过等离子体结构实现窄带光谱响应，因此覆盖完整的 sRGB 色域尤其具有挑战性。在这里，我们报告了一种用 90 nm 厚的低纵横比特征 (0.25-0.55) 的抗蚀剂纳米结构装饰的平面银膜。凭借如此简单且接近均匀的形态，我们通过实验证明了可见光范围内反射光谱的全宽半最大值 (FWHM) 的亚 20 纳米线宽，在色度图中实现与超高清电视（UHDTV）相当的色域。我们的工作打破了传统观念，即复杂且高纵横比的等离子体和介电纳米结构是必不可少的，而等离子体纳米打印不可能获得高度饱和的颜色。独特的结构实现了无蚀刻制造和回收配方，具有通过纳米压印光刻和其他应用（包括多色全息投影）进行大规模生产的潜力。