Abstract The fabrication of geometry-controlled Cu microwires (CuMWs) using melt co-drawing and electrochemical deposition techniques is reported in this study; the resulting CuMWs have good surface quality and integrity. By designing and arranging the poly(methyl methacrylate) (PMMA)/polystyrene (PS) and PMMA fibres artificially, porous PMMA templates with different coding orders (e.g. “1 × 1”, “3 × 3”, “5 × 5”, and “7 × 7”) are created after multi-step drawing followed by the dissolution of the inner PS. With these templates, coding arrays of CuMWs with diameters of 2–10 μm are fabricated. The geometries of the obtained templates and CuMWs arrays are shown to be consistent with the design values. This new approach extends the types and quality of CuMWs and makes it possible to devise extremely complex array structures with micro or even nano dimensions for diverse optical applications such as spectral sensing, laser phased arrays, and photonic crystal fibres.

中文翻译：

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使用熔融共拉和电化学沉积技术在多孔聚（甲基丙烯酸甲酯）模板中制备和表征几何控制的铜微线

摘要 本研究报道了使用熔体共拉和电化学沉积技术制备几何控制的铜微线 (CuMWs)；所得的 CuMW 具有良好的表面质量和完整性。通过人工设计和排列聚甲基丙烯酸甲酯（PMMA）/聚苯乙烯（PS）和PMMA纤维，获得不同编码顺序（例如“1×1”、“3×3”、“5×5”、和“7 × 7”）是在多步绘制之后创建的，然后是内部 PS 的溶解。使用这些模板，可以制造直径为 2-10 μm 的 CuMW 编码阵列。所得模板和 CuMWs 阵列的几何形状与设计值一致。