We report the growth of molybdenum trioxide (MoO3) nanoribbons (NRs) on epitaxial Ag and oriented Au nanostructures (NSs) using an ultra-high vacuum (UHV)-molecular beam epitaxy (MBE) technique at different substrate temperatures. An approximately 2 nm silver (Ag) film has been deposited at different growth temperatures (using UHV-MBE) on cleaned Si(100), Si(110), and Si(111) substrates. For faceted Au NSs, an approximately 50 nm Au film has been deposited (using high-vacuum thermal evaporation) on a Si(100) substrate with a native oxide layer at the interface and the sample was annealed in low vacuum (≈10−2) and at high temperature (≈975°C). Scanning electron microscopy measurements were performed to determine the morphology of MoO3/Ag and MoO3/Au composite films. From energy dispersive X-ray spectroscopy elemental mapping and line scans it is found that faceted Au NSs are more favorable for the growth of MoO3 NRs than epitaxial Ag microstructures.

中文翻译：

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三氧化钼纳米带在定向银和金纳米结构上的生长：扫描电子显微镜 (SEM) 研究

我们报告了三氧化钼 (MoO3) 在不同衬底温度下使用超高真空 (UHV)-分子束外延 (MBE) 技术在外延 Ag 和定向金纳米结构 (NS) 上制备纳米带 (NR)。在不同的生长温度下（使用 UHV-MBE）在清洁的 Si(100)、Si(110) 和 Si(111) 基板上沉积了大约 2 nm 的银 (Ag) 膜。对于多面金 NS，在 Si(100) 衬底上沉积了大约 50 nm 的金膜（使用高真空热蒸发），界面处有天然氧化物层，样品在低真空（≈10-2) 和高温 (≈975°C)。进行扫描电子显微镜测量以确定 MoO 的形态3/Ag 和 MoO3/Au 复合薄膜。从能量色散 X 射线光谱元素映射和线扫描中发现，刻面 Au NS 更利于 MoO的生长3NRs 优于外延 Ag 微结构。