Abstract This paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish.

中文翻译：

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一种新型磁场辅助的自由曲面大规模抛光

摘要 本文提出了一种新颖的磁场辅助质量抛光 (MAMP) 技术，用于同时对多个自由曲面部件进行高效精加工。MAMP 利用施加在环形腔外的旋转磁场，驱动磁性磨料撞击安装在腔内的工件并从其上去除材料。通过有限元方法分析了磁场对材料去除特性的影响。通过抛光实验研究了影响表面生成的因素。实验结果表明，MAMP 可有效抛光具有纳米表面光洁度的许多自由曲面。