Abstract This paper describes one of the series of works that aimed to investigate the impact of modulation frequency. This parameter is specific to plasma excitation and is associated with the properties of the thin films of copper nitride synthesized by magnetron sputtering. The studies reported in this paper focus on the changes in chemical and phase compositions of the Cu-N layers with respect to their electronic properties. The measurements obtained allowed studying the phenomena that occur during the synthesis of the metastable copper nitride. The results revealed that the synthesis processes are very sensitive to changes in sputtering parameters. It was also found that the modulation of sputtering frequency and the power influence the structure and consequently the properties of the synthesized layers.

中文翻译：

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磁控等离子体产生控制对氮化铜层结构和性能的影响

摘要 本文描述了旨在研究调制频率影响的系列作品之一。该参数特定于等离子体激发，并且与通过磁控溅射合成的氮化铜薄膜的特性有关。本文报道的研究集中在 Cu-N 层的化学和相组成相对于其电子特性的变化。获得的测量结果允许研究在合成亚稳态氮化铜过程中发生的现象。结果表明，合成过程对溅射参数的变化非常敏感。还发现溅射频率和功率的调制影响合成层的结构并因此影响其性质。