Abstract Reducing the enthalpy of as-deposited amorphous films is desirable as it improves their kinetic stability and enhances the reliability of resulting devices. Here we demonstrate that Ge15Te85 glass films of lower enthalpy are produced by increasing the voltage during magnetron sputter deposition. An increase of ~100 V leads to a drop in effective cooling rate of almost three orders of magnitude, thereby yielding markedly lower enthalpy glasses. The sputtering voltage therefore constitutes a novel parameter for tuning the fictive temperature of glass films, which could help to obtain ultra-stable glasses in combination with substrate temperature control.

中文翻译：

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玻璃态Ge15Te85磁控溅射沉积时有效冷却速率的控制

摘要 降低沉积态非晶薄膜的焓是可取的，因为它提高了它们的动力学稳定性并提高了所得器件的可靠性。在这里，我们证明了通过在磁控溅射沉积过程中增加电压来产生低焓的 Ge15Te85 玻璃膜。~100 V 的增加导致有效冷却速率下降近三个数量级，从而产生明显更低的焓玻璃。因此，溅射电压构成了调节玻璃薄膜假想温度的新参数，结合基板温度控制，有助于获得超稳定玻璃。