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In Situ Fabrication of Robust Cocatalyst‐Free CdS/g‐C3N4 2D–2D Step‐Scheme Heterojunctions for Highly Active H2 Evolution
Solar RRL ( IF 7.9 ) Pub Date : 2019-11-14 , DOI: 10.1002/solr.201900423
Doudou Ren 1, 2 , Weinan Zhang 2 , Yingna Ding 2 , Rongchen Shen 1, 2 , Zhimin Jiang 1, 2 , Xinyong Lu 1, 2 , Xin Li 1, 2
Affiliation  

Efficient H2O splitting for H2 evolution over the semiconductor photocatalyst is a crucial strategy in the field of energy and environment. Herein, cocatalyst‐free 2D–2D CdS/g‐C3N4 step‐scheme (S‐scheme) heterojunction photocatalysts are fabricated through in situ hydrothermal growth of 2D CdS nanosheets (NSs) on 2D g‐C3N4 NSs. The results clearly confirm that the binary CdS/0.7g‐C3N4 S‐scheme heterojunction shows the best H2 production rate (15.3 mmol g−1 h−1) without using any cocatalyst, which is 3.83 times and 3060 times higher than those of pure CdS and g‐C3N4, respectively. The apparent efficiency of CdS/0.7g‐C3N4 at 420 nm is 6.86%. Importantly, the as‐prepared CdS/0.7g‐C3N4 S‐scheme heterojunction has good stability when continuously irradiated for 21 h. The improved stability and activity are attributed to the formation of the S‐scheme heterojunction, which can markedly accelerate the interfacial charge separation for surface reaction. It is expected that the design of robust cocatalyst‐free CdS/g‐C3N4 2D–2D S‐scheme heterojunction can become a promising approach to develop the highly active H2 evolution systems based on various kinds of conventional semiconductor NSs.

中文翻译:

原位制备鲁棒的无助催化剂的CdS / g-C3N4 2D-2D阶梯式异质结,实现高活性的H2释放

在能源和环境领域,有效的H 2 O分解使H 2在半导体光催化剂上逸出是至关重要的策略。在此,通过在2D g-C 3 N 4 NS上原位水热生长2D CdS纳米片(NSs),制备了无助催化剂的2D-2D CdS / g-C 3 N 4阶梯式(S-方案)异质结光催化剂。结果清楚地表明,二元CdS / 0.7g‐C 3 N 4 S方案异质结显示出最佳的H 2生成速率(15.3 mmol g -1  h -1),而无需使用任何助催化剂,分别比纯CdS和g‐C 3 N 4的助催化剂高3.83倍和3060倍。CdS / 0.7g-C 3 N 4在420 nm处的表观效率为6.86%。重要的是,连续照射21小时后,所制备的CdS / 0.7g-C 3 N 4 S方案异质结具有良好的稳定性。稳定性和活性的提高归因于S型异质结的形成,这可以显着加速表面反应的界面电荷分离。预计将设计出无助催化剂的强效CdS / gC 3 N 42D–2D S方案异质结可能成为开发基于各种常规半导体NS的高活性H 2演化系统的有前途的方法。
更新日期:2019-11-14
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