The front cover illustrates a direct and metal‐catalyst‐free approach for producing high‐quality graphene films on insulating substrates via chemical vapor deposition, employing propionic acid as carbon source. Such method avoids the conventional film transfer process of graphene films, which can be directly integrated for highly capacitive micro‐supercapacitors. More information can be found in the Article by M. Wuttke et al.

中文翻译：

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用于具有大容量电容的微型超级电容器的绝缘基板上的石墨烯薄膜的直接无金属化学气相沉积

前盖说明了直接和无金属催化剂的方法，该方法使用丙酸作为碳源，通过化学气相沉积在绝缘基板上生产高质量的石墨烯薄膜。这种方法避免了石墨烯薄膜的常规薄膜转移过程，而石墨烯薄膜可以直接集成到高电容性微型超级电容器中。可以在M. Wuttke等人的文章中找到更多信息。