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Surface physics of semiconducting nanowires
Progress in Surface Science ( IF 6.4 ) Pub Date : 2016-02-01 , DOI: 10.1016/j.progsurf.2015.11.001
Michele Amato , Riccardo Rurali

Abstract Semiconducting nanowires (NWs) are firm candidates for novel nanoelectronic devices and a fruitful playground for fundamental physics. Ultra-thin nanowires, with diameters below 10 nm, present exotic quantum effects due to the confinement of the wave functions, e.g. widening of the electronic band-gap, deepening of the dopant states. However, although several reports of sub-10 nm wires exist to date, the most common NWs have diameters that range from 20 to 200 nm, where these quantum effects are absent or play a very minor role. Yet, the research activity on this field is very intense and these materials still promise to provide an important paradigm shift for the design of emerging electronic devices and different kinds of applications. A legitimate question is then: what makes a nanowire different from bulk systems? The answer is certainly the large surface-to-volume ratio. In this article we discuss the most salient features of surface physics and chemistry in group-IV semiconducting nanowires, focusing mostly on Si NWs. First we review the state-of-the-art of NW growth to achieve a smooth and controlled surface morphology. Next we discuss the importance of a proper surface passivation and its role on the NW electronic properties. Finally, stressing the importance of a large surface-to-volume ratio and emphasizing the fact that in a NW the surface is where most of the action takes place, we discuss molecular sensing and molecular doping.

中文翻译:

半导体纳米线的表面物理

摘要 半导体纳米线 (NW) 是新型纳米电子器件的坚定候选者,也是基础物​​理学的一个富有成果的游乐场。直径低于 10 nm 的超薄纳米线由于波函数的限制而呈现奇异的量子效应,例如电子带隙的加宽、掺杂状态的加深。然而,尽管迄今为止存在一些关于亚 10 nm 线的报告,但最常见的 NW 的直径范围为 20 到 200 nm,这些量子效应不存在或起很小的作用。然而,该领域的研究活动非常激烈,这些材料仍然有望为新兴电子设备的设计和不同类型的应用提供重要的范式转变。那么一个合理的问题是:是什么使纳米线与体系统不同?答案当然是大的表面积与体积比。在本文中,我们讨论了 IV 族半导体纳米线中表面物理和化学的最显着特征,主要关注 Si 纳米线。首先,我们回顾了 NW 生长的最新技术,以实现平滑和受控的表面形态。接下来我们讨论适当的表面钝化的重要性及其对 NW 电子特性的作用。最后,强调大表面积与体积比的重要性并强调在 NW 中表面是发生大部分动作的事实,我们讨论了分子传感和分子掺杂。主要关注Si NW。首先,我们回顾了 NW 生长的最新技术,以实现平滑和受控的表面形态。接下来我们讨论适当的表面钝化的重要性及其对 NW 电子特性的作用。最后,强调大表面积与体积比的重要性并强调在 NW 中表面是发生大部分动作的事实,我们讨论了分子传感和分子掺杂。主要关注Si NW。首先,我们回顾了 NW 生长的最新技术,以实现平滑和受控的表面形态。接下来我们讨论适当的表面钝化的重要性及其对 NW 电子特性的作用。最后,强调大表面积与体积比的重要性并强调在 NW 中表面是发生大部分动作的事实,我们讨论了分子传感和分子掺杂。
更新日期:2016-02-01
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