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Passivating Graphene and Suppressing Interfacial Phonon Scattering with Mechanically Transferred Large-Area Ga2O3
Nano Letters ( IF 10.8 ) Pub Date : 2022-11-21 , DOI: 10.1021/acs.nanolett.2c03492
Matthew Gebert 1, 2 , Semonti Bhattacharyya 1, 2, 3 , Christopher C Bounds 1 , Nitu Syed 4, 5 , Torben Daeneke 5, 6 , Michael S Fuhrer 1, 2
Affiliation  

We demonstrate a large-area passivation layer for graphene by mechanical transfer of ultrathin amorphous Ga2O3 synthesized on liquid Ga metal. A comparison of temperature-dependent electrical measurements of millimeter-scale passivated and bare graphene on SiO2/Si indicates that the passivated graphene maintains its high field effect mobility desirable for applications. Surprisingly, the temperature-dependent resistivity is reduced in passivated graphene over a range of temperatures below 220 K, due to the interplay of screening of the surface optical phonon modes of the SiO2 by high-dielectric-constant Ga2O3 and the relatively high characteristic phonon frequencies of Ga2O3. Raman spectroscopy and electrical measurements indicate that Ga2O3 passivation also protects graphene from further processing such as plasma-enhanced atomic layer deposition of Al2O3.

中文翻译:

用机械转移大面积 Ga2O3 钝化石墨烯和抑制界面声子散射

我们通过在液态 Ga 金属上合成的超薄非晶 Ga 2 O 3的机械转移展示​​了石墨烯的大面积钝化层。对 SiO 2 /Si上毫米级钝化石墨烯和裸石墨烯的温度依赖性电气测量结果的比较表明,钝化石墨烯保持其应用所需的高场效应迁移率。令人惊讶的是,由于高介电常数 Ga 2 O 3对 SiO 2的表面光学声子模式的屏蔽以及相对Ga 的高特征声子频率2 O 3。拉曼光谱和电学测量表明,Ga 2 O 3钝化还可以保护石墨烯免受进一步处理,例如 Al 2 O 3的等离子增强原子层沉积。
更新日期:2022-11-21
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