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Laboratory-scale X-ray absorption spectroscopy of 3d transition metals in inorganic thin films
Dalton Transactions ( IF 4 ) Pub Date : 2022-11-22 , DOI: 10.1039/d2dt02264h
Antti-Jussi Kallio 1 , Alexander Weiß 2 , Rene Bes 1, 3 , Mikko J Heikkilä 2 , Mikko Ritala 2 , Marianna Kemell 2 , Simo Huotari 1
Affiliation  

In this paper we present laboratory-scale X-ray absorption spectroscopy applied to the research of nanometer-scale thin films. We demonstrate the Cu K edge X-ray absorption near edge structure (XANES) and extended X-ray absorption fine structure (EXAFS) of CuI and CuO thin films grown with atomic layer deposition. Film thicknesses in the investigated samples ranged from 12 to 248 nm. Even from the thinnest films, XANES spectra can be obtained in 5–20 minutes and EXAFS in 1–4 days. In order to prove the capability of laboratory-based XAS for in situ measurements on thin films, we demonstrate an experiment on in situ oxidation of a 248 nm thick CuI film at a temperature of 240 °C. These methods have important implications for novel and enhanced possibilities for inorganic thin film research.

中文翻译:

无机薄膜中 3d 过渡金属的实验室规模 X 射线吸收光谱

在本文中,我们介绍了应用于纳米级薄膜研究的实验室级 X 射线吸收光谱。我们展示了通过原子层沉积生长的 CuI 和 CuO 薄膜的 Cu K 边缘 X 射线吸收近边缘结构 (XANES) 和扩展 X 射线吸收精细结构 (EXAFS)。所研究样品的薄膜厚度范围为 12 至 248 nm。即使是最薄的薄膜,XANES 光谱也可以在 5-20 分钟内获得,EXAFS 则需要 1-4 天。为了证明基于实验室的 XAS对薄膜进行原位测量的能力,我们展示了原位实验在 240 °C 的温度下氧化 248 nm 厚的 CuI 薄膜。这些方法对于无机薄膜研究的新颖和增强的可能性具有重要意义。
更新日期:2022-11-22
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