The interaction of gas cluster projectiles with the surface of the inorganic compounds is still not a fully understood issue. To clarify the features of silica surface sputtering by noble gas cluster projectiles of various species at normal and oblique incidences, molecular dynamics simulations are employed. The impacts of the Ne, Ar, and Kr clusters with the sizes N of 561 and 923 atoms and scaled kinetic energy E/N from 10 to 140 eV/atom are compared. It is found that the projectile energy per impact area unit E/S and per mass unit of cluster E/M are generalizing parameters of the sputtering efficiency of material in the form of scaled yield Y. The preferential sputtering of oxygen atoms is more sensitive to gas cluster species at normal incidence and decreases significantly with increasing projectile energy E/N. The regularities of the redistribution of the initial kinetic energy of projectiles between the scattered cluster atoms, ejected target atoms, and the target are revealed under the various impact conditions.

气体团簇射弹与无机化合物表面的相互作用仍然不是一个完全理解的问题。为了阐明各种惰性气体团簇射弹在垂直和倾斜入射下溅射二氧化硅表面的特征，采用分子动力学模拟。比较了大小N为 561 和 923 个原子的 Ne、Ar 和 Kr 簇的影响，以及从 10 到 140 eV/原子的缩放动能E/N 。发现单位撞击面积单位E/S和单位团簇质量单位E/M的弹丸能量是材料溅射效率的概括参数，以标度产率Y的形式表示。. 氧原子的优先溅射对法向入射的气体簇物种更敏感，并且随着射弹能量E/N的增加而显着降低。揭示了不同冲击条件下弹丸初始动能在散射团簇原子、弹射靶原子和靶之间的重新分布规律。