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Magnetic Properties of FeNi Films Prepared by Oblique Deposition at Different Growth Conditions
SPIN ( IF 1.8 ) Pub Date : 2022-08-27 , DOI: 10.1142/s201032472240001x
A. V. Svalov 1 , I. A. Makarochkin 1 , V. N. Lepalovskij 1 , A. A. Pasynkova 1 , A. A. Feshchenko 1, 2 , A. N. Gorkovenko 1 , G. V. Kurlyandskaya 1, 3
Affiliation  

FeNi films were prepared by oblique deposition onto glass substrate using magnetron sputtering deposition technique. The deposition was carried out on a rotating or nonrotating substrate with or without a constant magnetic field applied parallel to the substrate plane. The magnetic properties of the samples were measured by a magneto-optical Kerr effect at room temperature. All films had in-plane uniaxial magnetic anisotropy. The presence of in-plane magnetic anisotropy was also confirmed by the features of the domain structure. The main factor determining the orientation of the induced anisotropy axis of films was the magnetic field applied during deposition.



中文翻译:

不同生长条件下倾斜沉积制备FeNi薄膜的磁性能

采用磁控溅射沉积技术在玻璃基板上倾斜沉积制备 FeNi 薄膜。在旋转或非旋转基底上进行沉积,施加或不施加平行于基底平面的恒定磁场。样品的磁性能是在室温下通过磁光克尔效应测量的。所有薄膜都具有面内单轴磁各向异性。磁畴结构的特征也证实了面内磁各向异性的存在。决定薄膜感应各向异性轴方向的主要因素是沉积过程中施加的磁场。

更新日期:2022-08-27
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