Abstract

We substantiate the applicability of the stationary random process model to the subroughness (nanoroughness) profile of technical surfaces. The normality of the distribution of the nanoroughness-profile ordinates is verified by means of Pearson and Lilliefors goodness-of-fit tests. We calculate the autocorrelation functions and the spectral densities of the processes under study, as well as the correlation interval and the effective spectrum width. The examples show the possibility of calculating the surface nanoroughness-profile parameters on the basis of the autocorrelation function. The calculated parameter values coincide with those experimental within the error.

中文翻译：

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关于技术表面的纳米粗糙度：统计分析

摘要

我们证实了平稳随机过程模型对技术表面的亚粗糙度（纳米粗糙度）轮廓的适用性。通过 Pearson 和 Lilliefors 拟合优度检验验证了纳米粗糙度轮廓纵坐标分布的正态性。我们计算了所研究过程的自相关函数和谱密度，以及相关区间和有效谱宽。这些示例显示了基于自相关函数计算表面纳米粗糙度轮廓参数的可能性。计算的参数值与误差范围内的实验值一致。