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Surface Morphology and Optical Mutation Properties of V2O5 Films Prepared with Different Oxygen Partial Pressures
Integrated Ferroelectrics ( IF 0.7 ) Pub Date : 2022-07-28 , DOI: 10.1080/10584587.2022.2074225
Shengbin Zhang 1 , Yanhui Li 1, 2 , Nannan Zhu 3 , Dunwen Zuo 4 , Yuqi Wang 1 , Xiaoyu Chen 1
Affiliation  

Abstract

vanadium pentoxide films(V2O5) were deposited on sapphire substrates under four different oxygen partial pressures by magnetron sputtering. Then the films’ crystallinity, surface morphology and optical mutation properties were researched. The results show that all the prepared films are polycrystalline V2O5, and the crystallization performance gets better with the oxygen pressure increases. In addition, the Root-Mean-Square(RMS) roughness decrease with the increase of oxygen pressure. Furthermore, with the oxygen pressure increases, the optical turn-off time and turn-on time are 2.2 and 36 ms, respectively down to 1.7 and 30 ms, and before/after phase-change transmittance, meanwhile, decreases from 75%/20% to 57%/11%, showing a great improvement in optical mutation properties.



中文翻译:

不同氧分压制备V2O5薄膜的表面形貌和光学突变特性

摘要

五氧化二钒薄膜(V 2 O 5 )通过磁控溅射在四种不同氧分压下的蓝宝石衬底上沉积。然后研究了薄膜的结晶度、表面形貌和光学突变特性。结果表明,制备的薄膜均为多晶V 2 O 5, 结晶性能随着氧气压力的增加而变好。此外,均方根(RMS)粗糙度随着氧气压力的增加而降低。此外,随着氧气压力的增加,光学关闭时间和开启时间分别为 2.2 和 36 ms,分别下降到 1.7 和 30 ms,同时相变前后的透射率从 75%/20 % 到 57%/11%,表明光学突变特性有很大改善。

更新日期:2022-07-29
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