Colloidal photolithography is a versatile advanced technique for fabricating periodic nanopatterned arrays, with patterns carved exclusively on photoresist films deposited on solid substrates in a typical photolithographic process. In this study, we apply colloidal photolithography to polystyrene (PS) films half-covered with poly(methyl methacrylate) (PMMA) colloids at the air–water interface and demonstrate that periodic hole structures can be carved in PS films by two processes: photodecomposing PS films with ultraviolet (UV) light and removing PMMA colloids with a fluorinated solvent. Nonspherical holes, such as C-shaped and chiral comma-shaped holes, are also fabricated by regulating the UV illumination conditions. Furthermore, in addition to holes, convex patterns on PS films are realized by combining weak UV illumination with solvent treatment. We also demonstrate that actively using the water surface as the UV illumination field enables periodic silver nanoparticle spots to be deposited on PS films simply by dissolving silver ions in the water phase.

中文翻译：

---

通过在空气-水界面处的胶体光刻法在聚苯乙烯纳米片上形成孔、凸面和银纳米颗粒图案

胶体光刻是一种用于制造周期性纳米图案阵列的通用先进技术，在典型的光刻工艺中，图案仅刻在沉积在固体基板上的光刻胶薄膜上。在这项研究中，我们将胶体光刻技术应用于在空气 - 水界面半覆盖有聚（甲基丙烯酸甲酯）（PMMA）胶体的聚苯乙烯（PS）薄膜，并证明可以通过两种方法在PS薄膜中雕刻周期性孔结构：光分解PS 薄膜具有紫外线 (UV) 光，并使用氟化溶剂去除 PMMA 胶体。非球形孔，如C形孔和手性逗号形孔，也可以通过调节紫外光照条件来制造。此外，除了孔，PS 薄膜上的凸形图案是通过将弱紫外线照射与溶剂处理相结合来实现的。我们还证明，通过将水相中的银离子溶解，积极地使用水面作为紫外线照射场可以使周期性的银纳米颗粒点沉积在 PS 薄膜上。