Abstract

A systematic work was carried out to fabricate a phase-pure sputter target for thin film deposition of BaZr_0.80Y_0.20O_{3 – δ}. The current study mainly involves two parts; i.e. determination of the ideal parameters for phase-pure BaZr_0.80Y_0.20O_{3 – δ} synthesis, and the production of sputter target with a 2-inch diameter using deformable compaction die. For the synthesis, the effect of chelating and polymerization agents on the Pechini synthesis of BaZr_0.80Y_0.20O_{3 – δ} was investigated in detail. Ethylenediaminetetraacetic acid and citric acid as chelating agents were employed with different fractions, while ethylene glycol was preferred as a polymerization agent. The effect of calcination temperature ranging between 1000 and 1200°C was also investigated so as to eliminate the secondary phase formation. Subsequent to powder synthesis, the BaZr_0.80Y_0.20O_{3 – δ} sputter target having over 90% of its theoretical density was produced following powder pressing using deformable compaction die up to 150 MPa and sintering at 1500°C for 10 hours. BaZr_0.80Y_0.20O_{3 – δ} sputter target produced was then tested for a thin film deposition in a magnetron sputtering system for 12 h. Investigations carried out on the thin films deposited revealed that fully dense and highly textured crystalline BaZr_0.80Y_0.20O_{3 – δ} films could be deposited with the target produced in the study.

中文翻译：

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BaZr0.80Y0.20O3 - δ 薄膜质子导电氧化物溅射靶的制备

摘要

_{系统地制备了用于BaZr 0.80} Y _0.20 O _{3 - δ}薄膜沉积的相纯溅射靶材。目前的研究主要涉及两个部分；即确定相纯 BaZr _0.80 Y _0.20 O _{3 - δ}合成的理想参数，以及使用可变形压制模具生产直径为 2 英寸的溅射靶材。对于合成，螯合剂和聚合剂对 Pechini 合成 BaZr _0.80 Y _0.20 O _{3 – δ的影响}进行了详细调查。乙二胺四乙酸和柠檬酸作为螯合剂使用不同的馏分，而乙二醇作为聚合剂是优选的。还研究了在 1000 和 1200°C 之间的煅烧温度的影响，以消除第二相的形成。在粉末合成之后，在使用高达 150 MPa 的可变形压制模具进行粉末压制并在 1500°C 下烧结 10 小时后，生产出理论密度超过 90%的 BaZr _0.80 Y _0.20 O _{3 - δ溅射靶材。}BaZr _0.80 Y _0.20 O _{3 – δ}然后在磁控溅射系统中测试所产生的溅射靶材的薄膜沉积 12 小时。对沉积薄膜进行的研究表明，完全致密和高度织构的结晶 BaZr _0.80 Y _0.20 O _{3 - δ}薄膜可以与研究中生产的靶一起沉积。