Superconducting circuits based on Josephson junctions have the potential to achieve high speed and ultra-low power consumption, but their integration is limited by the low controllability of Nb-based tunnel junction and the existence of shunt resistors. In this work, we report the fabrication of superconductor/normal metal/superconductor (SNS) Josephson junctions with high reproducibility on oxidized Si substrates. The junctions based on NbN/TaN/NbN trilayers measured at 4.2 K show excellent Josephson properties with a wide range of critical current (I _c) from 227 to 2000 μA. The variations of critical current density (J _c) and characteristic voltage (V _c) are respectively less than 7.1% and 7.5% in the 2 inch region. The standard deviation of I _c is calculated to be less than 1.7% for Josephson arrays with the number of junctions up to 10 000 occupying an area of 0.34 mm². The results provide a guarantee for the applications of NbN-SNS Josephson junctions in superconducting large-scale integrated circuits.

中文翻译：

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用于大规模集成电路应用的 Si 基板上本征旁路 NbN/TaN/NbN 约瑟夫森结

基于约瑟夫森结的超导电路具有实现高速和超低功耗的潜力，但其集成度受到铌基隧道结可控性低和分流电阻存在的限制。在这项工作中，我们报告了在氧化硅基板上具有高再现性的超导体/普通金属/超导体 (SNS) 约瑟夫森结的制造。在 4.2 K 下测量的基于 NbN/TaN/NbN 三层结构的结显示出优异的约瑟夫森特性，具有广泛的临界电流（我 _c ) 从 227 到 2000μA. 临界电流密度的变化（杰 _c ) 和特征电压 (V _c )在2英寸区域分别小于7.1%和7.5%。的标准偏差我 _{经计算，约瑟夫森阵列的c}小于 1.7%，结数最多为 10000，占据的面积为 0.34 mm ²。该结果为NbN-SNS约瑟夫森结在超导大规模集成电路中的应用提供了保证。