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Electronic and Magnetic Properties of The Graphene/RE/Ni(111) (RE: La, Yb) Intercalation-Like Interfaces: A DFT Analysis
Advanced Theory and Simulations ( IF 3.3 ) Pub Date : 2022-04-30 , DOI: 10.1002/adts.202100621
Qilin Guo 1 , Roman Ovcharenko 2 , Beate Paulus 3 , Yuriy Dedkov 1, 4 , Elena Voloshina 1, 3, 4
Affiliation  

The effect of the rare-earth (RE) metals (La and Yb) intercalation on the electronic and magnetic properties of the graphene/Ni(111) interface is studied using state-of-the-art density functional theory calculations. In both systems, the intercalation of RE leads to the dramatic decrease of the magnetic moments of the Ni-interface atoms and to the negligible moments of C-atoms in a graphene layer, compared to the parent graphene/Ni(111) system. At the same time, the significant n-doping of graphene together with a band-gap opening is observed in both cases of the RE intercalation with a position of the graphene Dirac point reaching EDEF1.53 eV. Also the large density of states is found in the vicinity of the Fermi level (EF) along the MK direction for the graphene-derived π states which can be attributed to the joint effect of the intercalated RE and interface Ni atoms. These factors – increased density of states at EF and absence of magnetism of C-atoms in a graphene layer – indicate the possibility of the observation of the superconductive state in graphene in the considered RE-based systems, which is important for the understanding of these and other electronics effects in the graphene-based systems.

中文翻译:

石墨烯/RE/Ni(111) (RE: La, Yb) 类插层界面的电子和磁性特性:DFT 分析

使用最先进的密度泛函理论计算研究了稀土 (RE) 金属 (La 和 Yb) 插层对石墨烯/Ni(111) 界面的电子和磁性的影响。在这两个系统中,与母体石墨烯/Ni(111) 系统相比,RE 的嵌入导致 Ni 界面原子的磁矩显着降低,并且石墨烯层中 C 原子的磁矩可以忽略不计。同时,显着n-在稀土嵌入的两种情况下都观察到石墨烯的掺杂和带隙开口,石墨烯狄拉克点的位置达到D-F1.53 eV。在费米能级附近也发现了大的态密度(F) 沿着- K石墨烯衍生的方向π状态可归因于插入的 RE 和界面 Ni 原子的联合效应。这些因素——在F并且石墨烯层中没有 C 原子的磁性——表明在所考虑的基于 RE 的系统中观察石墨烯中的超导状态的可能性,这对于理解基于石墨烯的这些和其他电子效应很重要系统。
更新日期:2022-04-30
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