Inductively coupled atmospheric pressure plasma processing (IC-APPP) is a promising technique of generating freeform surfaces of silicon-based optics. A constant removal function related to the plasma jet morphology is important for ensuring fabrication efficiency and accuracy. However, the removal function of IC-APPP is variable due to the instability of the plasma jet morphology, thereby the need for real-time re-acquisition through multiple pre-experiments. In this study, a prediction method for the removal function of IC-APPP based on jet morphology monitoring and diagnosis is proposed to simplify the acquisition process of the removal function. According to the basic model of the Gaussian-shaped removal function, the peak removal rate (A) and the full-width at half-maximum (FWHM) are fitted as the function of the scanning velocity and jet diagnosis indexes based on the set of experimental data. A specific calculation equation can be used to rapidly predict the removal function of the current plasma jet. The revised prediction model can address dynamic changes in the plasma jet morphology by correcting the removal functions in real time. The set of processing experiments with a variable jet morphology confirms that the predicted peak removal rate (A) and FWHM are always off by less than 10% and 6% from the actual results, respectively. We believe that this prediction method is suitable for any IC-APPP process requiring a quantification of the plasma jet morphology.

电感耦合大气压等离子体处理 (IC-APPP) 是一种很有前途的技术，可以生成硅基光学器件的自由曲面。与等离子射流形态相关的恒定去除功能对于确保制造效率和准确性很重要。然而，由于等离子体射流形态的不稳定性，IC-APPP的去除功能是可变的，因此需要通过多次预实验进行实时重新采集。本研究提出了一种基于射流形态监测和诊断的IC-APPP去除函数预测方法，以简化去除函数的获取过程。根据高斯形去除函数的基本模型，峰值去除率（A）和半峰全宽（FWHM) 根据一组实验数据拟合为扫描速度和射流诊断指标的函数。可以使用特定的计算方程来快速预测当前等离子射流的去除函数。修正后的预测模型可以通过实时修正去除函数来解决等离子体射流形态的动态变化。一组具有可变射流形态的加工实验证实，预测的峰值去除率 ( A ) 和FWHM始终分别与实际结果相差不到 10% 和 6%。我们相信这种预测方法适用于任何需要对等离子射流形态进行量化的 IC-APPP 工艺。