The Mo-Si-B, Mo-Zr-Si-B, and Mo-Hf-Si-B coatings were deposited by magnetron sputtering of the MoSi₂-MoB, MoSi₂-MoB-ZrB₂ and MoSi₂-MoB-HfB₂ targets. The composition and structure of coatings were investigated by glow discharge optical emission spectroscopy, scanning electron microscopy, X-ray diffraction, transmission electron microscopy, X-ray photoelectron and Raman spectroscopy. Mechanical properties were measured by nanoindentation method. The short-time oxidation resistance of coatings was evaluated at temperatures of 1100, 1300, and 1500°C. The results showed that all coatings deposited onto alumina substrates were characterized by a dense columnar structure. Mo-Si-B coatings contained phases of hexagonal h-MoSi₂ and amorphous a-MoB. With the addition of Zr and Hf, an increase in the lattice parameter and a decrease in the grain size of h-MoSi₂ by 50 and 25%, respectively, were observed. The base Mo-Si-B coating had a high hardness of 30 GPa. The introduction of Zr and Hf led to a decrease in hardness by 24 and 20%, respectively. The Mo-Si-B coating was characterized by a minimal oxidation depth (<10 nm) at 1100°C and 1300°C, but a network of cracks that penetrated to the substrate was formed. Cracks on the surface of the Mo-Zr-Si-B and Mo-Hf-Si-B coatings were not observed; the formation of oxide layers, 0.3–2.0 μm thick, was revealed. The oxidation resistance of coatings at temperature of 1500°C increased in direction Mo-Si-B→Mo-Hf-Si-B→Mo-Zr-Si-B. The best results for the Mo-Zr-Si-B coating were associated with a smaller grain size, higher thermal stability, and the formation of a protective layer based on SiO₂ with the inclusion of ZrO₂ crystallites.

通过磁控溅射 MoSi ₂ -MoB、MoSi ₂ -MoB-ZrB ₂和 MoSi ₂ -MoB-HfB沉积 Mo-Si-B、Mo-Zr-Si-B 和 Mo-Hf-Si-B 涂层₂目标。通过辉光放电发射光谱、扫描电子显微镜、X射线衍射、透射电子显微镜、X射线光电子和拉曼光谱研究了涂层的组成和结构。力学性能采用纳米压痕法测定。在 1100、1300 和 1500°C 的温度下评估涂层的短时抗氧化性。结果表明，沉积在氧化铝基材上的所有涂层都具有致密的柱状结构。Mo-Si-B涂层包含六方h-MoSi ₂和非晶a-MoB相。随着Zr和Hf的加入，晶格参数增加，h-MoSi ₂晶粒尺寸减小分别观察到 50% 和 25%。基础 Mo-Si-B 涂层具有 30 GPa 的高硬度。Zr 和 Hf 的引入导致硬度分别降低了 24% 和 20%。Mo-Si-B 涂层的特点是在 1100°C 和 1300°C 时氧化深度最小（<10 nm），但形成了穿透到基材的裂缝网络。Mo-Zr-Si-B和Mo-Hf-Si-B涂层表面未观察到裂纹；揭示了0.3-2.0μm厚的氧化层的形成。1500℃时涂层的抗氧化性沿Mo-Si-B→Mo-Hf-Si-B→Mo-Zr-Si-B方向增加。Mo-Zr-Si-B 涂层的最佳结果与较小的晶粒尺寸、较高的热稳定性以及包含 ZrO 的基于 SiO _{2的保护层的形成有关2个}微晶。