The article focuses on some formation peculiarities of chromium nitride coatings in an argon and nitrogen atmosphere during the magnetron sputtering of a hot chromium target enhanced by a radio-frequency source of inductively-coupled plasma. In the work, the dependence of the deposition rate of coatings on the magnetron power density has been defined, and the contribution of sublimation to deposition rate enhancement has been examined in comparison with conventional sputtering of a cooled target. It has been shown that the dependence of the deposition rate on the magnetron power density is a nonlinearly increasing function of over 18 W/cm². By experiments and calculations, it has been proven that in the range from 18 to 28 W/cm² the target sublimation enables an increase in the deposition productivity by a factor from 2 to 12 compared with the cooled target sputtering under the same experimental conditions. For example, in the regime of planetary rotation of the substrates, the deposition rate reaches 5.2 nm/s at 28 W/cm². The elemental and structural-phase composition of the coatings deposited using the planetary rotation of substrates has been studied depending on a magnetron power density. It has been found that with an intense sublimation on the chromium target surface, the coatings have an inhomogeneous elemental and structural-phase composition. In addition, an alternation of chromium layers with a low content of chromium nitride and layers that mainly consist of chromium nitride has been determined.

本文重点讨论了在感应耦合等离子体射频源增强的热铬靶材磁控溅射过程中，氮化铬涂层在氩气和氮气气氛中的一些形成特性。在这项工作中，已经定义了涂层沉积速率对磁控管功率密度的依赖性，并与传统的冷却靶溅射相比，检查了升华对沉积速率提高的贡献。已经表明，沉积速率对磁控管功率密度的依赖性是超过 18 W/cm ²的非线性增加函数。通过实验和计算证明，在18~28 W/cm ^2范围内与相同实验条件下的冷却靶材溅射相比，靶材升华使沉积生产率提高了 2 到 12 倍。例如，在基板的行星旋转状态下，沉积速率在 28 W/cm ²时达到 5.2 nm/s 。已经根据磁控管功率密度研究了使用基板的行星旋转沉积的涂层的元素和结构相组成。已经发现，随着铬靶表面的强烈升华，涂层具有不均匀的元素和结构相组成。此外，已经确定了具有低氮化铬含量的铬层和主要由氮化铬组成的层的交替。