To increase the surface hardness of titanium (Ti), the boride layers composed of TiB₂ and TiB, were prepared on the CP-Ti substrate by spark plasma sintering (SPS) technique with micro-TiB₂ powders as boride source. Effects of sintering temperature and holding time on the microstructure, thickness, growth kinetic and hardness of boride layers were investigated. Experimental results showed that the boride layers were composed of a continuous TiB₂ top-layer and a TiB nano-whisker sub-layer. The maximum thickness of boride layers of TiB₂ and TiB were 2.24 ± 0.49 μm and 15.63 ± 6.97 μm, respectively. The activation energy of boron atom for the SPS boride process was calculated to be 386.49 kJmol⁻¹ for the TiB₂ layer and 343.57 kJmol⁻¹ for the TiB layer, which indicates that the SPS can provide enough energy that required in the surface treatment. Boride layers can grow well at a vacuum level of 6 Pa in the SPS. The borided Ti is about six times the hardness of the pure Ti. Boron atoms in the TiB₂ powders were activated by the high temperature and plasma, then reacted with Ti to form TiB nano-wiskers. The holding time of the present method was significantly shorter than other boriding processes. This SPS process provides a new approach for boriding of Ti and its alloys.

为了提高钛(Ti)的表面硬度，以微TiB ₂粉末为硼化物源，采用放电等离子烧结(SPS)技术在CP-Ti基体上制备了由TiB ₂和TiB组成的硼化物层。研究了烧结温度和保温时间对硼化物层微观结构、厚度、生长动力学和硬度的影响。实验结果表明，硼化物层由连续的TiB ₂顶层和TiB纳米晶须子层组成。TiB ₂和TiB的硼化物层的最大厚度分别为2.24±0.49μm和15.63±6.97μm。对于 SPS 硼化物工艺，硼原子的活化能为 TiB计算为 386.49 kJmol ^-1₂层和TiB层为343.57 kJmol ^-1，这表明SPS可以提供​​足够的表面处理所需的能量。在 SPS 中，硼化物层可以在 6 Pa 的真空水平下很好地生长。硼化钛的硬度约为纯钛的六倍。TiB ₂粉末中的硼原子被高温和等离子体活化，然后与Ti反应形成TiB纳米晶须。本方法的保持时间明显短于其他硼化工艺。这种 SPS 工艺为 Ti 及其合金的硼化提供了一种新方法。