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Direct Evidence of Subsurface Oxygen Formation in Oxide-Derived Cu by X-ray Photoelectron Spectroscopy
Angewandte Chemie International Edition ( IF 16.6 ) Pub Date : 2021-12-06 , DOI: 10.1002/anie.202116138
Hsin‐Yi Wang 1 , Markus Soldemo 1 , David Degerman 1 , Patrick Lömker 1, 2 , Christoph Schlueter 2 , Anders Nilsson 1 , Peter Amann 1, 3
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Subsurface oxygen in oxide-derived Cu is evidenced by X-ray photoelectron spectroscopy, as reported by Hsin-Yi Wang et al. in their Research Article (DOI: 10.1002/anie.202111021). The results point out that after reducing the Cu oxide precursor, two types of oxygen species, (i) oxygen staying at lattice defect and/or vacancies in the surface-most region and (ii) interstitial oxygen intercalated in metal structure, are embedded between the fully reduce metallic surface and the Cu2O buried beneath. This study adds the convincing support for the subsurface oxygen formation.
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中文翻译:

通过 X 射线光电子能谱法直接证明氧化物衍生的铜中形成亚表面氧

正如 Hsin-Yi Wang 等人报道的那样,X 射线光电子能谱证明了氧化物衍生的 Cu 中的亚表面氧。在他们的研究文章中(DOI:10.1002/anie.202111021)。结果指出,在还原 Cu 氧化物前体后,两种类型的氧物种,(i)停留在最表面区域的晶格缺陷和/或空位处的氧和(ii)插入金属结构中的间隙氧,嵌入在完全还原的金属表面和埋在下面的 Cu 2 O。这项研究为地下氧气的形成提供了令人信服的支持。
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更新日期:2021-12-06
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