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Extended aberration analysis in symmetry-free optical systems – part II: evaluation and application
Optics Express ( IF 3.8 ) Pub Date : 2021-12-02 , DOI: 10.1364/oe.439873
Ziyao Tang 1 , Herbert Gross 1, 2
Affiliation  

In part I [Opt. Express 29, 39967 (2021) [CrossRef] ] of this publication, the working principle of a mixed ray-tracing (MRT) method is introduced for surface-decomposed transverse aberration contributions, and the settings and various calculation options are discussed. Following part I, this paper is a supplement with the evaluation of the calculation results and more illustrations of practical applications, which focuses on the support of the MRT method during the symmetry-free optical system design process. The comprehensive analysis of a group of lithography systems as an application example proves that the MRT method is a powerful tool for imaging system performance assessment, as well as for relative sensitivity analysis among the surfaces in the optical system.

中文翻译:

无对称光学系统中的扩展像差分析——第二部分:评估和应用

在第一部分 [选项。该出版物的Express 29 , 39967 (2021) [CrossRef] ] 介绍了混合光线追踪 (MRT) 方法的工作原理,用于表面分解横向像差贡献,并讨论了设置和各种计算选项。在第一部分之后,本文是对计算结果的评估和更多实际应用说明的补充,重点介绍了在无对称光学系统设计过程中对 MRT 方法的支持。以一组光刻系统作为应用实例的综合分析证明,MRT方法是成像系统性能评估以及光学系统表面之间相对灵敏度分析的有力工具。
更新日期:2021-12-06
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