当前位置: X-MOL 学术J. Surfactants Deterg. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Effect of selenium-position on the redox responsivity of isomeric selenium-containing anionic surfactants
Journal of Surfactants and Detergents ( IF 1.6 ) Pub Date : 2021-10-29 , DOI: 10.1002/jsde.12559
Hui Chen 1 , Bo Zhu 1 , Yongmin Zhang 1 , Xuefeng Liu 1
Affiliation  

The effect of Se-position on the redox responsivity of three isomeric selenium-containing surfactants (CmSeCnSO4Na, n = 3, 8, and 11, m + n = 15) was investigated under the conditions of monomer, micelle, and adsorbed layer at the liquid paraffin-water interface. The divalent selenide group in CmSeCnSO4Na (the reduction form, CmSeCnSO4Na-Re) was oxidized to a more hydrophilic tetravalent selenoxide by the oxidation with H2O2 to afford CmSeOCnSO4Na (the oxidation form, CmSeCnSO4Na-Ox), and the selenoxide group of CmSeCnSO4Na-Ox could be reduced to selenide by the reduction with Na2SO3 to form CmSeCnSO4Na-Re again. In the oxidation process of the monomeric CmSeCnSO4Na in water, no obvious difference in the oxidation responsivity among three Se-position isomers was observed. In contrast, a remarkable effect of the Se-position on the oxidation responsivity was observed in the cases of CmSeCnSO4Na self-assemblies, including micelles and adsorbed layers at the liquid paraffin-water interface. Both the steric hindrance of the well-organized self-assemblies and the hydrophobic microenvironment of the selenide group in the self-assemblies hindered the Se atom from reacting with H2O2. The greater n, the harder was the oxidation of Se with H2O2. In the reduction process of CmSeCnSO4Na-Ox, the hydrophilic selenoxide group was exposed outright to water, allowing the selenoxide group to readily react with Na2SO3 regardless of whether CmSeCnSO4Na-Ox was self-assembled or not.

中文翻译:

硒位置对异构含硒阴离子表面活性剂氧化还原响应度的影响

 在单体、胶束条件下研究了Se位对三种异构含硒表面活性剂(C m SeC n SO 4 Na, n  = 3, 8, and 11, m  +  n = 15)氧化还原响应度的影响。 , 和液体石蜡-水界面的吸附层。C m SeC n SO 4 Na中的二价硒化物基团(还原形式,C m SeC n SO 4 Na-Re)通过与 H 2 O 2的氧化作用被氧化成更具亲水性的四价硒氧化物,得到 C m SeOCn SO 4 Na(氧化形式,C m SeC n SO 4 Na-Ox)和C m SeC n SO 4 Na-Ox的硒化基团可以通过与Na 2 SO 3的还原作用被还原为硒化物,形成C m Sec n SO 4 Na-Re 再次。在单体C m Secn SO 4的氧化过程中Na在水中,三种Se位异构体的氧化响应度没有明显差异。相比之下,在 C m SeC n SO 4 Na 自组装的情况下,观察到 Se 位置对氧化响应度的显着影响,包括液体石蜡-水界面处的胶束和吸附层。结构良好的自组装体的空间位阻和自组装体中硒化物基团的疏水性微环境都阻碍了Se原子与H 2 O 2反应。n越大,Se越难被H 2 O 2氧化。在 C m的还原过程中SeC n SO 4 Na-Ox,亲水性硒氧化物基团直接暴露在水中,使硒氧化物基团容易与Na 2 SO 3反应,而不管C m SeC n SO 4 Na-Ox是否自组装。
更新日期:2021-10-29
down
wechat
bug