Impurities on glass surfaces, such as metallic trace contaminations induced by manufacturing processes, can cause severely disturbing effects as for example, a reduction in laser resistance or optical performance. Both the amount and nature of such impurities was thus investigated in the present work. For this purpose, fused silica surfaces were produced by classical optics manufacturing consisting of cutting, grinding or lapping and polishing with different pad materials. After each production step, the amount and the chemical binding state of the trace contaminations of interest–calcium, cerium and sodium, originating from the used operating materials–were determined via X-ray photoelectron spectroscopy. It is shown that in the course of manufacturing the chemical bonds of these elements and its compounds are modified. The polished fused silica optics feature the trace elements sodium, cerium and calcium bound in the form of NaOH, Ce₂O₃ and CaF₂. Such surfaces moreover feature the lowest grade of contamination in the range of 0.2–0.5 atom-%.

中文翻译：

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经典光学制造引起的熔融石英表面金属痕量污染物的 XPS 分析

玻璃表面上的杂质，例如制造过程引起的金属痕量污染，会导致严重的干扰效应，例如激光电阻或光学性能的降低。因此，在目前的工作中研究了此类杂质的数量和性质。为此，熔融石英表面是通过经典光学制造生产的，包括切割、研磨或研磨以及使用不同的垫材料进行抛光。在每个生产步骤之后，通过 X 射线光电子能谱确定来自所用操作材料的痕量污染物（钙、铈和钠）的数量和化学结合状态。结果表明，在制造过程中，这些元素及其化合物的化学键发生了变化。₂ O ₃和CaF ₂。此外，此类表面具有 0.2-0.5 原子％范围内的最低污染等级。