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Scaling up of cluster beam deposition technology for catalysis application
Frontiers of Chemical Science and Engineering ( IF 4.5 ) Pub Date : 2021-10-19 , DOI: 10.1007/s11705-021-2101-7
Giuseppe Sanzone 1, 2 , Jinlong Yin 1 , Hailin Sun 1
Affiliation  

Many research works have demonstrated that the combination of atomically precise cluster deposition and theoretical calculations is able to address fundamental aspects of size-effects, cluster-support interactions, and reaction mechanisms of cluster materials. Although the wet chemistry method has been widely used to synthesize nanoparticles, the gas-phase synthesis and size-selected strategy was the only method to prepare supported metal clusters with precise numbers of atoms for a long time. However, the low throughput of the physical synthesis method has severely constrained its wider adoption for catalysis applications. In this review, we introduce the latest progress on three types of cluster source which have the most promising potential for scale-up, including sputtering gas aggregation source, pulsed microplasma cluster source, and matrix assembly cluster source. While the sputtering gas aggregation source is leading ahead with a production rate of ∼20 mg·h−1, the pulsed microplasma source has the smallest physical dimensions which makes it possible to compact multiple such devices into a small volume for multiplied production rate. The matrix assembly source has the shortest development history, but already show an impressive deposition rate of ∼10 mg·h−1. At the end of the review, the possible routes for further throughput scale-up are envisaged.



中文翻译:

用于催化应用的簇束沉积技术的放大

许多研究工作表明,原子级精确的团簇沉积和理论计算的结合能够解决团簇材料的尺寸效应、团簇-支撑相互作用和反应机制等基本方面。尽管湿化学方法已被广泛用于合成纳米粒子,但气相合成和尺寸选择策略是长期以来制备具有精确原子数的负载金属簇的唯一方法。然而,物理合成方法的低通量严重限制了其在催化应用中的广泛采用。在这篇综述中,我们介绍了三种最有潜力扩大规模的簇源的最新进展,包括溅射气体聚集源、脉冲微等离子体簇源、和矩阵组装集群源。而溅射气体聚集源以~20 mg·h的产率领先-1,脉冲微等离子体源具有最小的物理尺寸,这使得可以将多个这样的设备压缩成小体积以提高生产率。基质组装源具有最短的发展历史,但已经显示出令人印象深刻的~10 mg·h -1 的沉积速率。在审查结束时,设想了进一步扩大吞吐量的可能途径。

更新日期:2021-10-21
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