X-ray ptychography, a powerful scanning lensless imaging technique, has become attractive for nondestructively imaging internal structures at nanoscale. Stage positioning overhead in conventional step-scan ptychography is one of the limiting factors on the imaging throughput. In this work, we demonstrate the use of advanced fly scan ptychography to achieve high-resolution ptychograms of modern integrated circuits on a large field-of-view at millimeter scale. By completely removing stage overheads between scan points, the imaging time for millimeter-size sample can be significantly reduced. Furthermore, we implement the orthogonal probe relaxation technique to overcome the variation of illumination across the large scan area as well as local vibrations. The capability of x-ray ptychography shown here is broadly applicable for various studies, which requires both high spatial resolution and large scan area.

中文翻译：

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使用无透镜 X 射线成像在大视场中实现高空间分辨率

X 射线 ptychography 是一种强大的扫描无透镜成像技术，对于在纳米尺度上对内部结构进行非破坏性成像，已变得很有吸引力。传统步进扫描 ptychography 中的载物台定位开销是成像吞吐量的限制因素之一。在这项工作中，我们展示了使用先进的飞行扫描 ptychography 在毫米尺度的大视场上实现现代集成电路的高分辨率 ptychograms。通过完全消除扫描点之间的载物台开销，可以显着减少毫米级样品的成像时间。此外，我们实施正交探针弛豫技术来克服大扫描区域的照明变化以及局部振动。这里显示的 X 射线 ptychography 的能力广泛适用于各种研究，