We report a sulphate radical enhanced photoelectrochemical degradation of sulfamethoxazole on a solar light driven fluorine doped tin oxide - copper(I) oxide photoanode. Copper(I) oxide was prepared by a template-free method and dispersed onto the surface of a fluorine doped tin oxide glass to form the photoanode. UV–Vis diffuse reflectance spectroscopy showed that the photoanode absorbed in the visible light region. With sodium persulphate as the source of sulphate radical, photoelectrochemical degradation studies showed that sodium persulphate markedly enhanced the degradation of sulfamethoxazole. Studies on the effects of change in concentration of the persulphate and the absence of the persulphate on the photoelectrocatalytic degradation process were conducted. Overall, the extent of degradation and mineralisation of sulfamethoxazole in water was found to be 86% and 67% respectively with bias potential of 1.5 V for the sulphate radical enhanced process. Scavenger studies showed that the photogenerated holes and sulphate radicals were the primary active species in the abatement of sulfamethoxazole. The effectiveness of sulfamethoxazole removal in real matrices by the use of FTO-Cu₂O photoanode and sulphate radical was also confirmed.

我们报告了硫酸盐自由基增强了磺胺甲恶唑在太阳光驱动的掺氟氧化锡 - 氧化铜（I）光阳极上的光电化学降解。铜（I）氧化物是通过无模板方法制备的，并将其分散到掺氟氧化锡玻璃的表面以形成光阳极。紫外-可见漫反射光谱表明光阳极在可见光区域被吸收。以过硫酸钠为硫酸根的来源，光电化学降解研究表明，过硫酸钠显着增强了磺胺甲恶唑的降解。研究了过硫酸盐浓度变化和过硫酸盐不存在对光电催化降解过程的影响。总体，发现磺胺甲恶唑在水中的降解和矿化程度分别为 86% 和 67%，硫酸盐自由基增强过程的偏置电位为 1.5 V。清除剂研究表明，光生空穴和硫酸根自由基是消除磺胺甲恶唑的主要活性物质。使用 FTO-Cu 去除真实基质中磺胺甲恶唑的效果₂ O 光阳极和硫酸根也得到证实。