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Behavior of Electrons in the Bullet in the Ar/O₂ Plasma Jet in Changing Oxygen Concentration and the Applied Voltage
IEEE Transactions on Plasma Science ( IF 1.5 ) Pub Date : 2021-08-06 , DOI: 10.1109/tps.2021.3102079
Zihan Diao , Zhenyu Tan , Changqing Lu , Yufan Shi , Xiaolong Wang

This work presents a systematic numerical investigation on the behaviors of electrons in the bullet in the Ar/O 2 plasma jet in changing oxygen concentration and the applied voltage, based on a needle-plate discharge configuration and a 1-D particle-in-cell Monte-Carlo collision (PIC-MCC) method. The increase in oxygen concentration allows more electrons to be scattered toward the target, i.e., more electrons to most probably interact with the target, and induces a dramatic increase of reactive oxygen species (ROS), but leads to the decrease of the bullet velocity and average electron energy. In addition, there is a weak correlation between the electron density and ROS generation. When increasing the applied voltage, the electrons scattered toward the target decrease, however, the majority of these electrons, above 70%, are of energy higher than the threshold inducing a dissociative electron attachment (DEA) to water molecule, and meanwhile, there is an evident increase of high-energy electrons being able to excite water molecules. Also, there is a strong correlation between the electron density and ROS generation. The present results are also compared with those in the Ar/H 2 O plasma jets, indicating qualitative and quantitative differences.

中文翻译:

改变氧浓度和外加电压的 Ar/O₂ 等离子体射流中电子的行为

这项工作对 Ar/O 2中子弹中电子的行为进行了系统的数值研究。 基于针板放电配置和一维粒子在细胞内蒙特卡罗碰撞 (PIC-MCC) 方法,等离子体射流改变氧浓度和施加的电压。氧浓度的增加允许更多的电子向目标散射,即更多的电子最有可能与目标相互作用,并导致活性氧 (ROS) 急剧增加,但导致子弹速度和平均电子能量。此外,电子密度与 ROS 生成之间存在弱相关性。当增加施加的电压时,向目标散射的电子会减少,但是,这些电子中的大多数(超过 70%)的能量高于阈值,从而诱导离解电子附着 (DEA) 到水分子,同时,能够激发水分子的高能电子明显增加。此外,电子密度和 ROS 生成之间存在很强的相关性。目前的结果也与 Ar/H 2 O 等离子体射流,表明质量和数量上的差异。
更新日期:2021-09-17
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