There are several configurations of a microwave chemical vapor deposition (MWCVD) reactor. The common characteristic of this reactor is the presence of waveguides. We describe a method that replaces the waveguide, responsible for conducting electromagnetic waves, with a resonant cavity (RC) coupled to a low-pressure chamber. Using RCs over waveguides can help produce dense plasma, which can be used in dissociation processes as the reagents are forced to move within a cavity until they reach the reaction chamber. Based on the excellent performance of the system, it was possible to deposit silicon oxide (SiO ₂ ), with the aid of the argon gas mixture, oxygen, and tetraethylorthosilicate (TEOS), on a silicon substrate at room temperature. The film formed was analyzed using an interferometer and FTIR, concluding on the satisfactory quality of the film.

中文翻译：

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用微波 CVD 反应器中的谐振腔代替波导

微波化学气相沉积 (MWCVD) 反应器有多种配置。这种反应器的共同特征是波导的存在。我们描述了一种用耦合到低压室的谐振腔 (RC) 来代替负责传导电磁波的波导的方法。在波导上使用 RC 可以帮助产生致密的等离子体，这可用于解离过程，因为试剂被迫在腔内移动，直到它们到达反应室。基于该系统的优异性能，可以沉积氧化硅（SiO ₂ )，在氩气混合物、氧气和原硅酸四乙酯 (TEOS) 的帮助下，在室温下在硅基板上。使用干涉仪和 FTIR 分析形成的薄膜，得出薄膜质量令人满意的结论。